Liu Zhi-Lun, Grun Alexander, Chien Wei-Chih, Ray Asit, Lai Erh-Kun, Kuo I-Ting, Gignac Lynne, Lavoie Christian, BrightSky Matt, Lung Hsiang-Lan, Cheng Huai-Yu
IBM/Macronix PCRAM Joint Project, Yorktown Heights, NY, 10598, USA.
Macronix America Inc., Milpitas, CA, 95035, USA.
Sci Rep. 2024 Sep 27;14(1):22115. doi: 10.1038/s41598-024-73131-2.
Ovonic threshold switching (OTS) materials that are frequently used with a resistor (1S1R) in memory devices have been found to show controllable and reversible memory properties, which could enable new memory architectures. Here, we examine the impact of composition on the polarity-dependent memory properties of GeSe OTS materials and reveal that an increase in Se content results in a higher set voltage threshold (V), a lower reset current (I), and a higher set energy. Specifically, GeSe demonstrates two distinct V of 5.1 and 3.8 V, which retain after annealing at 85 ℃ for one day. We fabricated GeSe into 1000 by 1000 cross-point pillar arrays and tested 100 of them. The results demonstrated that these GeSe devices show similar memory properties with a reset speed of 1 μs, a set speed of 50 ns, and an endurance of over 10 cycles. Interestingly, the GeSe pillars' reset and set states could be attributed to polarized atomic distributions. By utilizing GeSe, we demonstrate a true cross-point switch-only-memory technology and provide mechanistic insights for self-selecting OTS materials.
在存储器件中经常与电阻器(1S1R)一起使用的双向阈值开关(OTS)材料已被发现具有可控且可逆的存储特性,这可能促成新的存储架构。在此,我们研究了成分对GeSe OTS材料极性相关存储特性的影响,并揭示出硒含量的增加会导致更高的置位电压阈值(V)、更低的复位电流(I)以及更高的置位能量。具体而言,GeSe表现出5.1 V和3.8 V两个不同的V值,在85℃退火一天后仍能保持。我们将GeSe制成1000×1000的交叉点柱阵列,并对其中100个进行了测试。结果表明,这些GeSe器件表现出相似的存储特性,复位速度为1 μs,置位速度为50 ns,耐久性超过10个循环。有趣的是,GeSe柱的复位和置位状态可归因于极化的原子分布。通过使用GeSe,我们展示了一种真正的仅交叉点开关的存储技术,并为自选择OTS材料提供了机理见解。