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用于对电子束敏感的金属有机框架的低剂量电子显微镜成像。

Low-dose electron microscopy imaging for beam-sensitive metal-organic frameworks.

作者信息

Liang Yuhang, Zhou Yi

机构信息

School of Physical Science and Technology and Shanghai Key Laboratory of High-Resolution Electron Microscopy ShanghaiTech University Shanghai201210 People's Republic of China.

出版信息

J Appl Crystallogr. 2024 Sep 5;57(Pt 5):1270-1281. doi: 10.1107/S1600576724007192. eCollection 2024 Oct 1.

Abstract

Metal-organic frameworks (MOFs) have garnered significant attention in recent years owing to their exceptional properties. Understanding the intricate relationship between the structure of a material and its properties is crucial for guiding the synthesis and application of these materials. (Scanning) Transmission electron microscopy (S)TEM imaging stands out as a powerful tool for structural characterization at the nanoscale, capable of detailing both periodic and aperiodic local structures. However, the high electron-beam sensitivity of MOFs presents substantial challenges in their structural characterization using (S)TEM. This paper summarizes the latest advancements in low-dose high-resolution (S)TEM imaging technology and its application in MOF material characterization. It covers aspects such as framework structure, defects, and surface and interface analysis, along with the distribution of guest molecules within MOFs. This review also discusses emerging technologies like electron ptychography and outlines several prospective research directions in this field.

摘要

金属有机框架材料(MOFs)近年来因其卓越的性能而备受关注。了解材料结构与其性能之间的复杂关系对于指导这些材料的合成和应用至关重要。(扫描)透射电子显微镜(S)TEM成像作为一种用于纳米级结构表征的强大工具脱颖而出,能够详细描述周期性和非周期性局部结构。然而,MOFs对电子束的高敏感性在使用(S)TEM对其进行结构表征时带来了重大挑战。本文总结了低剂量高分辨率(S)TEM成像技术的最新进展及其在MOF材料表征中的应用。它涵盖了诸如框架结构、缺陷、表面和界面分析等方面,以及客体分子在MOFs中的分布。本综述还讨论了像电子叠层成像术这样的新兴技术,并概述了该领域的几个前瞻性研究方向。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2992/11460399/ed13562d716f/j-57-01270-fig1.jpg

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