Stankus Vytautas, Vasiliauskas Andrius, Guobienė Asta, Andrulevičius Mindaugas, Meškinis Šarūnas
Institute of Materials Science, Kaunas University of Technology, K. Baršausko St. 59, LT-51423 Kaunas, Lithuania.
Molecules. 2024 Nov 6;29(22):5247. doi: 10.3390/molecules29225247.
In the present research, hexagonal boron nitride (h-BN) films were deposited by reactive high-power impulse magnetron sputtering (HiPIMS) of the pure boron target. Nitrogen was used as both a sputtering gas and a reactive gas. It was shown that, using only nitrogen gas, hexagonal-boron-phase thin films were synthesized successfully. The deposition temperature, time, and nitrogen gas flow effects were studied. It was found that an increase in deposition temperature resulted in hydrogen desorption, less intensive hydrogen-bond-related luminescence features in the Raman spectra of the films, and increased h-BN crystallite size. Increases in deposition time affect crystallites, which form larger conglomerates, with size decreases. The conglomerates' size and surface roughness increase with increases in both time and temperature. An increase in the nitrogen flow was beneficial for a significant reduction in the carbon amount in the h-BN films and the appearance of the h-BN-related features in the lateral force microscopy images.
在本研究中，通过对纯硼靶进行反应性高功率脉冲磁控溅射（HiPIMS）沉积六方氮化硼（h-BN）薄膜。氮气既用作溅射气体又用作反应气体。结果表明，仅使用氮气就成功合成了六方硼相薄膜。研究了沉积温度、时间和氮气流的影响。发现沉积温度升高导致氢脱附，薄膜拉曼光谱中与氢键相关的发光特征变弱，且h-BN微晶尺寸增大。沉积时间增加会影响微晶，使其形成更大的团聚体，尺寸减小。团聚体的尺寸和表面粗糙度随时间和温度的升高而增加。氮气流增加有利于显著降低h-BN薄膜中的碳含量，并在侧向力显微镜图像中出现与h-BN相关的特征。
