磁控溅射沉积Ti-CuN薄膜的表面化学计量比和深度剖析

Surface Stoichiometry and Depth Profile of Ti-CuN Thin Films Deposited by Magnetron Sputtering.

作者信息

Mukhopadhyay Arun Kumar, Roy Avishek, Bhattacharjee Gourab, Das Sadhan Chandra, Majumdar Abhijit, Wulff Harm, Hippler Rainer

机构信息

Department of Physics, Indian Institute of Engineering Science and Technology, Shibpur, Howrah 711103, India.

Department of Physics, Dinabandhu Andrews College, 54 Raja S.C. Mallick Road, Kolkata 700008, India.

出版信息

Materials (Basel). 2021 Jun 9;14(12):3191. doi: 10.3390/ma14123191.

DOI:10.3390/ma14123191

PMID:34207839

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8227993/

Abstract

We report the surface stoichiometry of Tix-CuyNz thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu3N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti3CuN phase.

摘要

我们报告了Tix-CuyNz薄膜的表面化学计量随膜深度的变化情况。薄膜通过高功率脉冲磁控溅射（HiPIMS）和直流磁控溅射（DCMS）沉积。通过X射线光电子能谱（XPS）研究沉积薄膜中Ti、Cu和N的组成。在较大深度处，薄膜中Cu和Ti的相对组成相对于表面有所增加。薄膜表面存在的不定形碳的量随膜深度显著减少。沉积薄膜还含有大量来源尚不完全清楚的氧。掠入射X射线衍射（GIXD）表明表面存在Cu3N相，而透射电子显微镜（TEM）显示为多晶结构且存在Ti3CuN相。