GaAs Solar Cells Grown Directly on V-Groove Si Substrates.

The direct epitaxial growth of high-quality III-V semiconductors on Si is a challenging materials science problem with a number of applications in optoelectronic devices, such as solar cells and on-chip lasers. We report the reduction of dislocation density in GaAs solar cells grown directly on nanopatterned V-groove Si substrates by metal-organic vapor-phase epitaxy. Starting from a template of GaP on V-groove Si, we achieved a low threading dislocation density (TDD) of 3 × 10 cm in the GaAs by performing thermal cycle annealing of the GaAs followed by growth of InGaAs dislocation filter layers. This approach eliminates the need for a metamorphic buffer to directly integrate low-TDD GaAs on Si. We used these low-TDD GaAs/V-groove Si templates to grow GaAs double heterostructures that had a minority carrier lifetime of 5.7 ns, as measured by time-resolved photoluminescence, a value consistent with the material quality associated with a 20%+ efficient GaAs solar cell. However, front-junction GaAs solar cells grown on these low-TDD substrates produced a conversion efficiency of only 6.6% without an antireflection coating. Electron channeling contrast imaging measurements on this cell showed a high density of misfit dislocations at the interface between the AlInP/GaInP window layer and the GaAs absorber and between the GaAs absorber and the GaInP back surface field (BSF), likely causing a high surface recombination velocity and thus poor performance. We showed that we could reduce (and in the case of the BSF, eliminate) these dislocations by employing an AlGaAs-based window layer and BSF. Compared to GaInP, AlGaAs has dislocation glide properties that are more similar to those of GaAs, resulting in more even threading dislocation glide between layers. AlGaAs passivation improved the external quantum efficiency and open-circuit voltage of the devices, but the overall device performance was still low at an efficiency of 7.7% without an antireflection coating, likely due to cracking in the devices. This work demonstrates a route to high material quality in GaAs grown directly on Si that can be used for the production of III-V/Si optoelectronic devices.