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通过差异甲基化进行的短期高光胁迫分析确定了根系结构和细胞大小反应。

Short-Term High Light Stress Analysis Through Differential Methylation Identifies Root Architecture and Cell Size Responses.

作者信息

Nair Akshay U, Kundariya Hardik S, Samantaray Devidutta, Dopp Isaac J, Allu Annapurna Devi, Mackenzie Sally A

机构信息

Departments of Biology and Plant Science, Pennsylvania State University, State College, Pennsylvania, USA.

Department of Biology, Indian Institute of Science Education and Research (IISER) Tirupati, Tirupati, Andhra Pradesh, India.

出版信息

Plant Cell Environ. 2025 May;48(5):3269-3280. doi: 10.1111/pce.15325. Epub 2024 Dec 25.

Abstract

DNA methylation repatterning is an epigenomic component of plant stress response, but the extent that methylome data can elucidate changes in plant growth following stress onset is not known. We applied high-resolution DNA methylation analysis to decode plant responses to short- and long-term high light stress and, integrating with gene expression data, attempted to predict components of plant growth response. We identified 105 differentially methylated genes (DMGs) following 1 h of high light treatment and 193 DMGs following 1 week of intermittent high light treatment. Two distinct methylome-predicted plant growth responses to high light treatment could be confirmed by linking methylome changes in auxin response pathways to observed changes in root architecture and methylome changes in cell cycle pathway components to endoreduplication and palisade cell enlargement. We observed methylome changes in a cyclic GMP-dependent protein kinase in association with high light stress signalling. The ability to associate intragenic methylation repatterning with predictable plant phenotypic outcomes after a limited period of high light treatment allows for data-based early prediction of plant growth responses. The approach also permits the dissection of gene networks underpinning plant growth adjustments during environmental change to uncover dynamic phenotype determinants.

摘要

DNA甲基化重编程是植物应激反应的一个表观基因组组成部分,但甲基化组数据能够阐明应激开始后植物生长变化的程度尚不清楚。我们应用高分辨率DNA甲基化分析来解码植物对短期和长期高光胁迫的反应,并结合基因表达数据,试图预测植物生长反应的组成部分。我们在高光处理1小时后鉴定出105个差异甲基化基因(DMG),在间歇性高光处理1周后鉴定出193个DMG。通过将生长素反应途径中的甲基化组变化与观察到的根系结构变化联系起来,以及将细胞周期途径成分中的甲基化组变化与核内复制和栅栏细胞增大联系起来,可以确认两种不同的甲基化组预测的植物对高光处理的生长反应。我们观察到一个环鸟苷酸依赖性蛋白激酶中的甲基化组变化与高光胁迫信号有关。在有限的高光处理期后,将基因内甲基化重编程与可预测的植物表型结果联系起来的能力,使得基于数据的植物生长反应早期预测成为可能。该方法还允许剖析环境变化期间支撑植物生长调节的基因网络,以揭示动态表型决定因素。

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