Yu Junfeng, Ding Jihong, Wang Tao, Huang Yukai, Du Wenzhang, Liang Jiao, Ma Hongping, Zhang Qingchun, Li Liang, Huang Wei, Zhang Wei
State Key Laboratory of ASIC and System, Shanghai Institute of Intelligent Electronics & Systems, School of Microelectronics, Fudan University, Shanghai 200433, China.
East China Institute of Photo-Electron IC, Bengbu 233000, China.
Nanomaterials (Basel). 2024 Dec 11;14(24):1984. doi: 10.3390/nano14241984.
The trapping mechanism at the AlGaN/GaN interface in the p-GaN high electron mobility transistors (HEMTs) and its impact on the turn-on characteristics of direct-coupled FET logic (DCFL) inverters were investigated across various supply voltages () and test frequencies (). The frequency-conductance method identified two trap states at the AlGaN/GaN interface (trap activation energy - ranges from 0.345 eV to 0.363 eV and 0.438 eV to 0.47 eV). As increased from 1.5 V to 5 V, the interface traps captured more electrons, increasing the channel resistance () and drift-region resistance () of the p-GaN HEMTs and raising the low-level voltage () from 0.56 V to 1.01 V. At = 1 kHz, sufficient trapping and de-trapping led to a delay of 220 µs and a instability of 320 mV. Additionally, as increased from 1 kHz to 200 kHz, a positive shift in the threshold voltage of p-GaN HEMTs occurred due to the dominance of trapping. This shift caused to rise from 1.02 V to 1.40 V and extended the fall time () from 153 ns to 1 µs. This investigation enhances the understanding of DCFL GaN inverters' behaviors from the perspective of device physics on power switching applications.