Liu Yu, Yang Shuzhang, Hua Lina, Yang Xiaomin, Li Enlong, Wen Jincheng, Wu Yanqiu, Zhu Liping, Yang Yingguo, Zhao Yan, An Zhenghua, Chu Junhao, Li Wenwu
State Key Laboratory of Photovoltaic Science and Technology, Department of Materials Science, Institute of Optoelectronics, Fudan University, Shanghai, 200433, China.
Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Fudan University, Shanghai, 200433, China.
Nat Commun. 2025 Jan 3;16(1):365. doi: 10.1038/s41467-024-55113-0.
Ferroelectric semiconductors have the advantages of switchable polarization ferroelectric field regulation and semiconductor transport characteristics, which are highly promising in ferroelectric transistors and nonvolatile memory. However, it is difficult to prepare a Sn-based perovskite film with both robust ferroelectric and semiconductor properties. Here, by doping with 2-methylbenzimidazole, Sn-based perovskite [93.3 mol% (FACs)SnI and 6.7 mol% PEASnI] semiconductor films are transformed into ferroelectric semiconductor films, owing to molecular reconfiguration. The reconfigured ferroelectric semiconductors exhibit a high remanent polarization (P) of 23.2 μC/cm. The emergence of ferroelectricity can be ascribed to the hydrogen bond enhancement after imidazole molecular doping, and then the spatial symmetry breaks causing the positive and negative charge centers to become non-coincident. Remarkably, the transistors based on perovskite ferroelectric semiconductors have a low subthreshold swing of 67 mv/dec, which further substantiates the superiority of introducing ferroelectricity. This work has developed a method to realize Sn-based ferroelectric semiconductor films for electronic device applications.
铁电半导体具有可切换极化、铁电场调控以及半导体输运特性等优点,在铁电晶体管和非易失性存储器方面极具前景。然而,制备兼具强铁电和半导体性能的锡基钙钛矿薄膜却颇具难度。在此,通过掺杂2-甲基苯并咪唑,锡基钙钛矿[93.3摩尔%(FACs)SnI和6.7摩尔% PEASnI]半导体薄膜因分子重排而转变为铁电半导体薄膜。重新配置的铁电半导体展现出23.2 μC/cm的高剩余极化(P)。铁电性的出现可归因于咪唑分子掺杂后氢键增强,进而导致空间对称性破缺,使正负电荷中心不再重合。值得注意的是,基于钙钛矿铁电半导体的晶体管具有67 mv/dec的低亚阈值摆幅,这进一步证实了引入铁电性的优越性。这项工作开发了一种用于电子器件应用的实现锡基铁电半导体薄膜的方法。