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硒界面层提高范德华电子学中的高迁移率和开关比。

Selenium Interface Layers Boost High Mobility and Switch Ratios in van der Waals Electronics.

作者信息

Zhang Chi, Li Enlong, Gao Caifang, Wang Ruixue, Liu Xinling, Liu Yu, Yuan Feng, Shi Wu, Lin Yen-Fu, Chu Junhao, Li Wenwu

机构信息

Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Department of Materials Science, Fudan University, Shanghai 200433, China.

State Key Laboratory of Photovoltaic Science and Technology, Fudan University, Shanghai 200433, China.

出版信息

Nano Lett. 2025 Jan 15;25(2):655-662. doi: 10.1021/acs.nanolett.4c04467. Epub 2025 Jan 6.

Abstract

Achieving high mobility while minimizing off-current and static power consumption is critical for applications of two-dimensional field-effect transistors. Herein, a selenium (Se) sacrificial layer is introduced between the rhenium sulfide (ReS) semiconductor and source/drain electrode. With the Se layer and postannealing process, the ReS transistor significantly decreases the off-state current with a substantial increase in the on-state current density. Notably, the mobility reaches 237 cm V s, which is accompanied by an extraordinary current on/off ratio of 10 at 7 K. The theoretical calculations and noise analysis show that the improvement in device performance is ascribed to the Se protective layer, which effectively shields the semiconductor from direct exposure to high-energy metal particles, reducing the Schottky barrier and the number of defect states at the interface. Finally, Se sacrificial ReS transistor-based versatile logic circuits including NAND and NOR logic are executed, which can be widely applied in integrated circuits.

摘要

在二维场效应晶体管的应用中,在将关态电流和静态功耗降至最低的同时实现高迁移率至关重要。在此,在硫化铼(ReS)半导体与源极/漏极电极之间引入了硒(Se)牺牲层。通过硒层和后退火工艺,ReS晶体管显著降低了关态电流,同时大幅提高了开态电流密度。值得注意的是,迁移率达到237 cm² V⁻¹ s⁻¹,在7 K时具有高达10⁷的出色电流开/关比。理论计算和噪声分析表明,器件性能的提升归因于硒保护层,它有效地保护半导体免受高能金属颗粒的直接暴露,降低了肖特基势垒和界面处的缺陷态数量。最后,实现了基于硒牺牲ReS晶体管的包括与非门和或非门逻辑的通用逻辑电路,其可广泛应用于集成电路。

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