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氧化石墨烯增强混合浆料制备及其对CVD单晶金刚石的抛光特性研究

The Investigation of Graphene Oxide-Enhanced Hybrid Slurry Preparation and Its Polishing Characteristic on CVD Single Crystal Diamond.

作者信息

Wang Zixuan, Zhao Yang, Yao Jie, Yu Tianbiao, Qu Sheng, Zhao Jun

机构信息

School of Mechanical Engineering and Automation, Northeastern University, Shenyang 110819, China.

Liaoning Provincial Key Laboratory of High-End Equipment Intelligent Design and Manufacturing Technology, Northeastern University, Shenyang 110819, China.

出版信息

Materials (Basel). 2024 Dec 11;17(24):6053. doi: 10.3390/ma17246053.

Abstract

As an environment-friendly material, graphene oxide nanosheet can effectively improve the polishing surface quality of single crystal diamond workpieces. However, the lubricating and chemical effects of graphene oxide nanosheets have an uncertain impact on the polishing material removal rate. In this paper, the graphene oxide-enhanced hybrid slurry was prepared with good stability. The femtosecond laser etching and contour measurement method was adopted to analyze the polishing material removal rate of the CVD single crystal diamond workpiece. The surface damage of the workpiece polished with SiC abrasive grains is minimal, while the workpiece with diamond abrasive grains has the largest material removal rate. With an increase in abrasive grain size, the polishing material removal rate increases, but new surface scratches and pits can be introduced if the grain size is too large. Therefore, a grain size of 2.5 μm was selected to improve the surface quality. The surface roughness first decreases and then increases with the increase in polishing rotation speed. At a speed of 4000 rpm, the surface roughness reached its minimum with a relatively high material removal rate simultaneously. A series of CVD single crystal diamond scratching experiments were conducted with different scratching speeds, which proved that graphene oxide can help facilitate material surface micro-protrusion removal.

摘要

作为一种环境友好型材料,氧化石墨烯纳米片能够有效提升单晶金刚石工件的抛光表面质量。然而,氧化石墨烯纳米片的润滑和化学作用对抛光材料去除率有着不确定的影响。本文制备了具有良好稳定性的氧化石墨烯增强混合磨料浆。采用飞秒激光蚀刻和轮廓测量方法来分析化学气相沉积(CVD)单晶金刚石工件的抛光材料去除率。用碳化硅磨粒抛光的工件表面损伤最小,而用金刚石磨粒抛光的工件材料去除率最大。随着磨粒尺寸的增大,抛光材料去除率增加,但如果磨粒尺寸过大,会引入新的表面划痕和凹坑。因此,选择2.5μm的磨粒尺寸来提高表面质量。表面粗糙度随着抛光转速的增加先减小后增大。在4000转/分钟的转速下,表面粗糙度达到最小值,同时材料去除率相对较高。进行了一系列不同划痕速度的CVD单晶金刚石划痕实验,结果表明氧化石墨烯有助于促进材料表面微凸起的去除。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ca01/11727918/8ad0092bd7f3/materials-17-06053-g001.jpg

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