Pederson Christian, Yama Nicholas S, Beale Lane, Markham Matthew, Turiansky Mark E, Fu Kai-Mei C
University of Washington, Physics Department, Seattle, Washington 98105, United States.
University of Washington, Electrical and Computer Engineering Department, Seattle, Washington 98105, United States.
Nano Lett. 2025 Jan 15;25(2):673-680. doi: 10.1021/acs.nanolett.4c04657. Epub 2024 Dec 30.
The charge state of a quantum point defect in a solid-state host strongly determines its optical and spin characteristics. Consequently, techniques for controlling the charge state are required to realize technologies for quantum networking and sensing. In this work, we demonstrate the use of deep-ultraviolet (DUV) radiation to dynamically neutralize nitrogen- (NV) and silicon-vacancy (SiV) centers. We first examine the neutralization of NV by correlating the NV and NV spectra, indicating > 99% polarization into NV. We then examine the time dynamics of SiV photoluminescence, observing an 80% reduction of intensity within a single 100 μs DUV pulse. Finally, we demonstrate that this DUV-induced bleaching is accompanied by a dramatic increase in the SiV population that is robust to extended periods of near-infrared excitation. Our results indicate the potential of above-band gap excitation as a universal means of generating neutral charge states of quantum point defects on demand.
固态基质中量子点缺陷的电荷态强烈决定其光学和自旋特性。因此,实现量子网络和传感技术需要控制电荷态的技术。在这项工作中,我们展示了使用深紫外(DUV)辐射来动态中和氮(NV)和硅空位(SiV)中心。我们首先通过关联NV和NV光谱来研究NV的中和,表明超过99%的极化转变为NV。然后我们研究SiV光致发光的时间动态,观察到在单个100 μs DUV脉冲内强度降低了80%。最后,我们证明这种DUV诱导的漂白伴随着SiV数量的显著增加,这种增加对长时间的近红外激发具有鲁棒性。我们的结果表明,带隙以上激发作为一种按需产生量子点缺陷中性电荷态的通用手段具有潜力。