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通过具有协同效应的界面工程实现的性能提升的自供电钙钛矿CHNHPbI/SnO异质结光电探测器。

Improved self-powered perovskite CHNHPbI/SnO heterojunction photodetectors achieved by interfacial engineering with a synergic effect.

作者信息

Li Guipeng, Zhang Huimin, Qin Weihao, Chen Mingming

机构信息

Department of Microelectronics, Jiangsu University Zhenjiang Jiangsu 212013 China

School of Materials Science and Engineering, East China University of Science and Technology Shanghai 200237 China.

出版信息

RSC Adv. 2025 Jan 27;15(4):2749-2757. doi: 10.1039/d4ra08892a. eCollection 2025 Jan 23.

Abstract

Lead halide perovskite heterojunctions have been considered as important building blocks for fabricating high-performance photodetectors (PDs). However, the interfacial defects induced non-radiative recombination and interfacial energy-level misalignment induced ineffective carrier transport severely limit the performance of photodetection of resulting devices. Herein, interfacial engineering with a spin-coating procedure has been studied to improve the photodetection performance of CHNHPbI/SnO heterojunction PDs, which were fabricated by sputtering a SnO thin film on ITO glass followed by spin-coating a CHNHPbI thin film. It has shown that spin-coating of a SnO layer on the sputtered SnO thin films suppressed the surface oxygen vacancies of SnO thin films and up-shifted their conduction band, which suppressed the interfacial non-radiative recombination and enhanced the carriers transport at the CHNHPbI/SnO interface, respectively. Accordingly, improved photodetection performance, such as the reduced dark current and increased photocurrent, has been observed in the CHNHPbI/SnO heterojunction PDs, where the responsivity and detectivity of 0.077 A W and 2.0 × 10 jones, respectively, at the zero bias have been demonstrated. These results show a simple way to suppress the interfacial non-radiative recombination and enhance the carrier transport at the interface to fabricate improved perovskite heterojunction PDs in the future.

摘要

卤化铅钙钛矿异质结被认为是制造高性能光电探测器(PD)的重要组成部分。然而,界面缺陷引起的非辐射复合以及界面能级失配引起的无效载流子传输严重限制了所得器件的光电探测性能。在此,研究了采用旋涂工艺的界面工程,以提高CHNH PbI/SnO异质结光电探测器的光电探测性能,该探测器是通过在ITO玻璃上溅射SnO薄膜,然后旋涂CHNH PbI薄膜制备的。结果表明,在溅射的SnO薄膜上旋涂SnO层抑制了SnO薄膜的表面氧空位并使其导带向上移动,这分别抑制了界面非辐射复合并增强了CHNH PbI/SnO界面处的载流子传输。因此,在CHNH PbI/SnO异质结光电探测器中观察到了改进的光电探测性能,例如暗电流降低和光电流增加,其中在零偏压下的响应度和探测率分别为0.077 A/W和2.0×10琼斯。这些结果展示了一种简单的方法,可在未来抑制界面非辐射复合并增强界面处的载流子传输,以制造性能更优的钙钛矿异质结光电探测器。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3e99/11770876/778e4d44020c/d4ra08892a-f1.jpg

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