Yoon Minwook, Park Yunkyu, Sim Hyeji, Kwon Hee Ryeong, Lee Yujeong, Jang Ho Won, Choi Si-Young, Son Junwoo
Department of Materials Science and Engineering, Seoul National University, Seoul, 08826, Republic of Korea.
Research Institute of Advanced Materials, Seoul National University, Seoul, 08826, Republic of Korea.
Adv Mater. 2025 Apr;37(15):e2413062. doi: 10.1002/adma.202413062. Epub 2025 Feb 11.
Light-driven energy conversion devices call for the atomic-level manipulation of defects associated with electronic states in solids. However, previous approaches to produce oxygen vacancy (V) as a source of sub-bandgap energy levels have hampered the precise control of the distribution and concentration of V. Here, a new strategy to spatially confine V at the homo-interfaces is demonstrated by exploiting the sequential growth of anatase TiO under dissimilar thermodynamic conditions. Remarkably, metallic behavior with high carrier density and electron mobility is observed after sequential growth of the TiO films under low pressure and temperature (L-TiO) on top of high-quality anatase TiO epitaxial films (H-TiO), despite the insulating properties of L-TiO and H-TiO single layers. Multiple characterizations elucidate that the V layer is geometrically confined within 4 unit cells at the interface, along with low-temperature crystallization of upper L-TiO films; this 2D V layer is responsible for the formation of in-gap states, promoting photocarrier lifetime (≈300%) and light absorption. These results suggest a synthetic strategy to locally confine functional defects and emphasize how sub-bandgap energy levels in the confined imperfections influence the kinetics of light-driven catalytic reactions.
光驱动能量转换装置需要对与固体电子态相关的缺陷进行原子级操控。然而,先前将氧空位(V)作为亚带隙能级来源的方法阻碍了对V的分布和浓度的精确控制。在此,通过利用在不同热力学条件下锐钛矿TiO的顺序生长,展示了一种在同质界面处空间限制V的新策略。值得注意的是,尽管低压和低温TiO(L-TiO)和高质量锐钛矿TiO外延膜(H-TiO)单层具有绝缘特性,但在高质量锐钛矿TiO外延膜(H-TiO)顶部顺序生长低压和低温TiO(L-TiO)薄膜后,观察到具有高载流子密度和电子迁移率的金属行为。多种表征表明,V层在几何上被限制在界面处的4个晶胞内,同时上层L-TiO薄膜发生低温结晶;这种二维V层负责形成带隙内态,延长光生载流子寿命(约300%)并促进光吸收。这些结果提出了一种局部限制功能缺陷的合成策略,并强调了受限缺陷中的亚带隙能级如何影响光驱动催化反应的动力学。