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碘化亚铜薄膜的光电特性及超快载流子动力学

Optoelectronic properties and ultrafast carrier dynamics of copper iodide thin films.

作者信息

Li Zhan Hua, He Jia Xing, Lv Xiao Hu, Chi Ling Fei, Egbo Kingsley O, Li Ming-De, Tanaka Tooru, Guo Qi Xin, Yu Kin Man, Liu Chao Ping

机构信息

Department of Physics, College of Science, Shantou University, 515063, Shantou, Guangdong, China.

Center of Semiconductor Materials and Devices, Shantou University, 515063, Shantou, Guangdong, China.

出版信息

Nat Commun. 2022 Oct 26;13(1):6346. doi: 10.1038/s41467-022-34117-8.

Abstract

As a promising high mobility p-type wide bandgap semiconductor, copper iodide has received increasing attention in recent years. However, the defect physics/evolution are still controversial, and particularly the ultrafast carrier and exciton dynamics in copper iodide has rarely been investigated. Here, we study these fundamental properties for copper iodide thin films by a synergistic approach employing a combination of analytical techniques. Steady-state photoluminescence spectra reveal that the emission at ~420 nm arises from the recombination of electrons with neutral copper vacancies. The photogenerated carrier density dependent ultrafast physical processes are elucidated with using the femtosecond transient absorption spectroscopy. Both the effects of hot-phonon bottleneck and the Auger heating significantly slow down the cooling rate of hot-carriers in the case of high excitation density. The effect of defects on the carrier recombination and the two-photon induced ultrafast carrier dynamics are also investigated. These findings are crucial to the optoelectronic applications of copper iodide.

摘要

作为一种有前景的高迁移率p型宽带隙半导体,碘化亚铜近年来受到了越来越多的关注。然而,其缺陷物理/演化仍存在争议,特别是碘化亚铜中的超快载流子和激子动力学很少被研究。在此,我们通过结合多种分析技术的协同方法研究碘化亚铜薄膜的这些基本性质。稳态光致发光光谱表明,~420nm处的发射源于电子与中性铜空位的复合。利用飞秒瞬态吸收光谱阐明了光生载流子密度依赖的超快物理过程。在高激发密度情况下,热声子瓶颈效应和俄歇加热效应均显著减慢了热载流子的冷却速率。还研究了缺陷对载流子复合的影响以及双光子诱导的超快载流子动力学。这些发现对于碘化亚铜的光电子应用至关重要。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a87a/9606309/d3b78df0a811/41467_2022_34117_Fig1_HTML.jpg

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