Tsekpo Yao Mawuena, Smok Weronika, Matus Krzysztof, Hajduk Barbara, Radoń Adrian, Jarka Paweł, Tanski Tomasz
Department Engineering Materials and Biomaterials, Faculty of Mechanical Engineering, Silesian University of Technology, Konarskiego 18A, 44-100 Gliwice, Poland.
Materials Testing Laboratory, Faculty of Mechanical Engineering, Silesian University of Technology, Konarskiego 18A, 44-100 Gliwice, Poland.
Polymers (Basel). 2025 Jan 31;17(3):384. doi: 10.3390/polym17030384.
Poly(methyl methacrylate) (PMMA) polymer has unlocked new frontiers in the field of nanotechnology and is suitable for a wide range of applications. However, its optical band gap limits its use in optoelectronics. This study aims to ascertain the influence of varying montmorillonite and magnetite ratios on the optical properties of electrospun PMMA nanofibres produced from solution. The nanofibres were characterised using Fourier-transform infrared spectroscopy (FTIR), atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray diffractometry (XRD), energy-dispersive X-ray spectroscopy (EDX), spectroscopic ellipsometry, and UV-Vis spectroscopy (UV-Vis). XRD analysis revealed the successful incorporation of magnetite and montmorillonite within the PMMA matrix, with diameters ranging from 203 to 328 nm. The incorporation of magnetite and montmorillonite altered the light absorption characteristics of PMMA, resulting in increased absorption in the ultraviolet and visible light regions compared to pristine PMMA and a reduction in the optical band gap from 4.9 eV to 2.5 eV. These findings suggest that PMMA is a suitable host matrix for montmorillonite and magnetite. The observed properties also indicate the suitability of the produced materials for optoelectronic applications, including chemical sensors and protective UV coatings.
聚甲基丙烯酸甲酯(PMMA)聚合物在纳米技术领域开辟了新的前沿,适用于广泛的应用。然而,其光学带隙限制了它在光电子学中的应用。本研究旨在确定不同蒙脱石和磁铁矿比例对溶液法制备的电纺PMMA纳米纤维光学性能的影响。使用傅里叶变换红外光谱(FTIR)、原子力显微镜(AFM)、扫描电子显微镜(SEM)、X射线衍射仪(XRD)、能量色散X射线光谱仪(EDX)、光谱椭偏仪和紫外可见光谱(UV-Vis)对纳米纤维进行了表征。XRD分析表明磁铁矿和蒙脱石成功地掺入了PMMA基体中,直径范围为203至328nm。磁铁矿和蒙脱石的掺入改变了PMMA的光吸收特性,与原始PMMA相比,紫外和可见光区域的吸收增加,光学带隙从4.9eV降低到2.5eV。这些发现表明PMMA是蒙脱石和磁铁矿合适的主体基体。观察到的性能还表明所制备的材料适用于光电子应用,包括化学传感器和紫外防护涂层。