Åstrand Mattias, Vogt Ulrich, Yang Runqing, Villanueva Perez Pablo, Li Tang, Lyubomirskiy Mikhail, Kahnt Maik
KTH Royal Institute of Technology, Department of Applied Physics, Bio-Opto-Nano Physics, Albanova University Center, 106 91, Stockholm, Sweden.
MAX IV Laboratory, Lund University, Box 118, 221 00, Lund, Sweden.
Sci Rep. 2025 Mar 18;15(1):9273. doi: 10.1038/s41598-025-93757-0.
X-ray ptychography provides the highest resolution non-destructive imaging at synchrotron radiation facilities, and the efficiency of this method is crucial for coping with limited experimental time. Recent advancements in multi-beam ptychography have enabled larger fields of view, but spatial resolution for large 3D samples remains constrained by their thickness, requiring consideration of multiple scattering events. Although this challenge has been addressed using multi-slicing in conventional ptychography, the integration of multi-slicing with multi-beam ptychography has not yet been explored. Here we present the first successful combination of these two methods, enabling high-resolution imaging of nanofeatures at depths comparable to the lateral dimensions that can be addressed by state-of-the-art multi-beam ptychography. Our approach is robust, reproducible across different beamlines, and ready for broader application. It marks a significant advancement in the field, establishing a new foundation for high-resolution 3D imaging of larger, thicker samples.
X射线叠层成像技术在同步辐射装置中提供了最高分辨率的无损成像，该方法的效率对于应对有限的实验时间至关重要。多光束叠层成像技术的最新进展使得视野更大，但大型三维样品的空间分辨率仍受其厚度限制，需要考虑多次散射事件。尽管在传统叠层成像中使用多切片方法解决了这一挑战，但多切片与多光束叠层成像的结合尚未得到探索。在此，我们展示了这两种方法的首次成功结合，能够对深度与横向尺寸相当的纳米特征进行高分辨率成像，而横向尺寸可通过最先进的多光束叠层成像技术实现。我们的方法稳健，可在不同光束线上重复，并且随时可广泛应用。它标志着该领域的重大进展，为更大、更厚样品的高分辨率三维成像奠定了新基础。
