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具有优异光响应的外延反铁电BiOS薄膜。

Epitaxial Antiferroelectric BiOS Films with Superior Photoresponse.

作者信息

Wang Yong-Jyun, Chuang Chuan, Chung Chia-Chen, Chu Po-Chih, Lin Wei-Chun, Zhang Jian-Wei, Chueh Yu-Lun, Yang Zhenzhong, Huang Rong, Chang Keng-Hung, Liu Heng-Jui, Liu Hsiang-Lin, Sun Jia-Yuan, Chang Xin-Yun, Chan Hao-Che, Luo Chih-Wei, Sheu Yu-Miin, Wu Jyh-Ming, Chen Yi-Cheng, Chu Ying-Hao

机构信息

Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 300044, Taiwan.

Department of Photonics, National Sun Yat-sen University, Kaohsiung 804201, Taiwan.

出版信息

ACS Appl Mater Interfaces. 2025 Apr 9;17(14):21392-21400. doi: 10.1021/acsami.4c22419. Epub 2025 Mar 27.

Abstract

Two-dimensional bismuth oxychalcogenide is a rising material system with superior electronic properties. However, a lack of high-quality synthesis impedes the exploration of fundamental understanding and practical applications. This work presents high-quality epitaxial BiOS films on (LaAlO)(SrTaAlO) with diverse properties by taking advantage of lattice compatibility. The atomically resolved sharp interface of BiOS/(LaAlO)(SrTaAlO) heteroepitaxy is observed with the verification of centrosymmetric breaking through microscopic evidence and macroscopic characterizations. Such an epitaxial feature of the BiOS film provides an essential step for applications compared to those of chemically synthesized nanomaterials. The interior polarization and piezoelectricity can be investigated through atomic-scale observation and RhB degradation of BOS. Meanwhile, this synthesized system can achieve a strong photoresponse with an on/off ratio of ∼10 and a responsivity of ∼60 mA/W in the range of red light (620-750 nm). With these advantages, the demonstrated epitaxial BiOS shows a huge potential for applications in high-performance optoelectronic devices.

摘要

二维硫属氧化铋是一种具有优异电子特性的新兴材料体系。然而,缺乏高质量的合成方法阻碍了对其基本理解和实际应用的探索。这项工作利用晶格兼容性,在(LaAlO)(SrTaAlO)上制备了具有多种特性的高质量外延BiOS薄膜。通过微观证据和宏观表征验证了中心对称破缺,观察到了BiOS/(LaAlO)(SrTaAlO)异质外延的原子分辨清晰界面。与化学合成的纳米材料相比,BiOS薄膜的这种外延特性为其应用提供了关键一步。可以通过原子尺度观察和BOS的RhB降解来研究内部极化和压电性。同时,该合成体系在红光(620 - 750 nm)范围内可实现开/关比约为10、响应度约为60 mA/W的强光响应。凭借这些优势,所展示的外延BiOS在高性能光电器件应用中显示出巨大潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/90f6/11986903/811f586f1880/am4c22419_0001.jpg

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