用于亚微米分辨率同步辐射X射线成像的1英寸GTAGG:Ce单晶的晶体生长与表征

Crystal growth and characterization of 1-inch GTAGG: Ce single crystal for sub-micron resolution synchrotron radiation X-ray imaging.

作者信息

Omuro Kazuya, Yoshino Masao, Gushchina Liudmila, Yamamoto Seiichi, Nakanishi Kohei, Kamada Kei, Bartosiewicz Karol, Kim Kyoung Jin, Horiai Takahiko, Murakami Rikito, Yamaji Akihiro, Hanada Takashi, Yokota Yuui, Kurosawa Shunsuke, Ohashi Yuji, Sato Hiroki, Kataoka Jun, Yoshikawa Akira

机构信息

Graduate School of Engineering, Tohoku University, 6-6 Aramaki Aza Aoba, Aoba-ku, Sendai, 980-8579, Miyagi, Japan.

Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, 980-8577, Miyagi, Japan.

出版信息

Sci Rep. 2025 Apr 15;15(1):12993. doi: 10.1038/s41598-025-96031-5.

DOI:10.1038/s41598-025-96031-5

PMID:40234490

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC12000448/

Abstract

A high-performance Ce-doped (Gd, Tb)(Ga, Al)O (GTAGG: Ce) single crystal was engineered and characterized, demonstrating a high application potential for advanced X-ray imaging. A transparent 1-inch diameter single crystal was grown using the Czochralski method, demonstrating a significant advancement in large-scale scintillator production. Comprehensive characterization using X-ray diffraction and electron probe micro-analysis confirmed the crystal's structural integrity. Photoluminescence and radioluminescence spectroscopy demonstrated efficient bidirectional energy transfer between Ce and Tb ions, a critical mechanism enhancing the performance of the scintillator. X-ray imaging tests were performed using crystals with a thickness of 100 μm at the Aichi Synchrotron Radiation Center. Comparison with the industry-standard LuAG: Ce scintillator showed that the GTAGG: Ce crystal produced 2.4 times higher light output and achieved a high spatial resolution of 0.85 μm. The results indicated that GTAGG: Ce is suitable for the next generation of high-performance X-ray imaging detectors in scientific and medical imaging applications.

摘要

制备并表征了一种高性能的铈掺杂(Gd, Tb)(Ga, Al)O（GTAGG: Ce）单晶，展示了其在先进X射线成像方面的高应用潜力。采用提拉法生长了直径1英寸的透明单晶，这表明在大规模闪烁体生产方面取得了重大进展。通过X射线衍射和电子探针微分析进行的综合表征证实了晶体的结构完整性。光致发光和放射发光光谱表明铈离子和铽离子之间存在有效的双向能量转移，这是提高闪烁体性能的关键机制。在爱知同步辐射中心使用厚度为100μm的晶体进行了X射线成像测试。与行业标准的LuAG: Ce闪烁体相比，GTAGG: Ce晶体的光输出高出2.4倍，实现了0.85μm的高空间分辨率。结果表明，GTAGG: Ce适用于科学和医学成像应用中的下一代高性能X射线成像探测器。