Zhang Shuai, Barbosa Andre N, Paiva de Araujo Monteiro de Barros Munique Eva, Mello Alexandre, Lizárraga Kevin, Venezuela Pedro Paulo de Mello, Freire Fernando Lázaro
Department of Physics, Pontifícia Universidade Católica do Rio de Janeiro, Rio de Janeiro 22451-900, Brazil.
Laboratory of Surfaces and Nanostructures, Brazilian Center for Physics Research, Rio de Janeiro 22290-180, Brazil.
ACS Omega. 2025 Apr 9;10(15):15663-15672. doi: 10.1021/acsomega.5c01066. eCollection 2025 Apr 22.
Monolayer tungsten disulfide (WS) is a direct-band-gap semiconductor that has excellent luminescence properties, which are of great interest for optoelectronic applications. In this study, we investigated the effect of gallium (Ga) on WS monolayers grown by chemical vapor deposition. Our results indicate that Ga-doped WS exhibits a 3.6-fold increase in photoluminescence intensity for doped samples compared to pristine WS. To confirm the existence of Ga in the WS structures, resonance Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were utilized as characterization methods. A redshift of the XPS spectrum was observed as well as an increase in the disorder-related Raman modes, which were attributed to the influence of Ga. XPS analysis and ab initio electronic structure calculations reveal the presence of substitutional Ga atoms as well as Ga atoms adsorbed on WS surfaces.
单层二硫化钨(WS)是一种具有优异发光特性的直接带隙半导体,在光电子应用中备受关注。在本研究中,我们研究了镓(Ga)对通过化学气相沉积生长的WS单层的影响。我们的结果表明,与原始WS相比,Ga掺杂的WS在掺杂样品中的光致发光强度提高了3.6倍。为了确认WS结构中Ga的存在,采用共振拉曼光谱和X射线光电子能谱(XPS)作为表征方法。观察到XPS光谱发生红移以及与无序相关的拉曼模式增加,这归因于Ga的影响。XPS分析和从头算电子结构计算揭示了替代Ga原子以及吸附在WS表面的Ga原子的存在。