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将原子级薄的过渡金属二硫属化物半导体中的点缺陷识别为活性掺杂剂。

Identification of Point Defects in Atomically Thin Transition-Metal Dichalcogenide Semiconductors as Active Dopants.

作者信息

Seo Seung-Young, Yang Dong-Hwan, Moon Gunho, Okello Odongo F N, Park Min Yeong, Lee Suk-Ho, Choi Si-Young, Jo Moon-Ho

出版信息

Nano Lett. 2021 Apr 28;21(8):3341-3354. doi: 10.1021/acs.nanolett.0c05135. Epub 2021 Apr 7.

DOI:10.1021/acs.nanolett.0c05135
PMID:33825482
Abstract

Selective doping in semiconductors is essential not only for monolithic integrated circuity fabrications but also for tailoring their properties including electronic, optical, and catalytic activities. Such active dopants are essentially point defects in the host lattice. In atomically thin two-dimensional (2D) transition-metal dichalcogenides (TMDCs), the roles of such point defects are particularly critical in addition to their large surface-to-volume ratio, because their bond dissociation energy is relatively weaker, compared to elemental semiconductors. In this Mini Review, we review recent advances in the identifications of diverse point defects in 2D TMDC semiconductors, as active dopants, toward the tunable doping processes, along with the doping methods and mechanisms in literature. In particular, we discuss key issues in identifying such dopants both at the atomic scales and the device scales with selective examples. Fundamental understanding of these point defects can hold promise for tunability doping of atomically thin 2D semiconductor platforms.

摘要

半导体中的选择性掺杂不仅对于单片集成电路制造至关重要,而且对于调整其包括电子、光学和催化活性在内的特性也至关重要。此类活性掺杂剂本质上是主体晶格中的点缺陷。在原子级厚度的二维(2D)过渡金属二硫属化物(TMDC)中,除了具有较大的表面体积比之外,此类点缺陷的作用尤为关键,因为与元素半导体相比,它们的键解离能相对较弱。在本综述中,我们回顾了二维TMDC半导体中作为活性掺杂剂的各种点缺陷识别方面的最新进展,以实现可调谐掺杂过程,同时介绍了文献中的掺杂方法和机制。特别是,我们通过具体示例讨论了在原子尺度和器件尺度上识别此类掺杂剂的关键问题。对这些点缺陷的基本理解有望实现原子级薄二维半导体平台的可调谐掺杂。

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