Du Hanlin, Xia Hongyan, Tang Yun, Cao Ke, Ma Jiajun, Yang Junxiao
School of Materials and Chemistry and State Key Laboratory of Environmentally-Friendly Energy Materials, Southwest University of Science and Technology, Mianyang 621010, China.
Department of Applied Sciences, Northumbria University, Newcastle Upon Tyne NE1 8ST, U.K.
ACS Omega. 2025 Apr 12;10(15):15219-15228. doi: 10.1021/acsomega.4c10940. eCollection 2025 Apr 22.
UV-curable resins with a low dielectric constant can be processed or patterned to form required shapes, making them highly applicable to special fields. Unlike conventional photoresists limited by the polarization effect due to highly polar bonds, an all-hydrocarbon-type low-dielectric photoresist was designed and synthesized with excellent performance. Based on previous works, the film-forming resin poly 1-(4-vinylphenyl)-2-(4-benzocyclobutenyl)ethylene-styrene (P-DVB-St) was prepared by introducing styrene (St) into the 1-(4-vinylphenyl)-2-(4-benzocyclobutenyl)ethene (DVB) backbone via anionic polymerization, and the photoresist properties were improved by adjusting the cross-linking density of the polymer. The introduction of styrene improved the mechanical properties while maintaining the photolithographic patterning properties of the photoresist. Since the resin has a dual UV/thermal-cured structure, it has better thermal stability ( = 401 °C), lower dielectric constant (2.62 at 10 MHz) and dielectric loss (1.7 × 10), and better photolithographic patterning (the graphic resolution is 5 μm).
具有低介电常数的紫外光固化树脂可以进行加工或图案化以形成所需形状，使其在特殊领域具有高度适用性。与因高极性键受偏振效应限制的传统光刻胶不同，设计并合成了一种性能优异的全烃型低介电光刻胶。基于先前的工作，通过阴离子聚合将苯乙烯（St）引入到1-(4-乙烯基苯基)-2-(4-苯并环丁烯基)乙烯（DVB）主链中制备了成膜树脂聚1-(4-乙烯基苯基)-2-(4-苯并环丁烯基)乙烯-苯乙烯（P-DVB-St），并通过调节聚合物的交联密度改善了光刻胶性能。苯乙烯的引入在保持光刻胶光刻图案化性能的同时提高了机械性能。由于该树脂具有双重紫外/热固化结构，它具有更好的热稳定性（=401℃）、更低的介电常数（10MHz时为2.62）和介电损耗（1.7×10），以及更好的光刻图案化性能（图形分辨率为5μm）。
