Uemura E, Levin E D, Bowman R E
Exp Neurol. 1985 Sep;89(3):520-9. doi: 10.1016/0014-4886(85)90003-2.
Synaptic density was quantitated in the entorhinal cortex and subiculum of rats at 5, 21, 34, and 95 postnatal days. These rats were offspring of mothers that had been subjected to four different concentrations of halothane during gestation and for 60 days after birth. The exposure conditions were control, intermittent halothane (25 +/- 5 ppm or 100 +/- 5 ppm, 8 h/day, 5 days/week) and continuous halothane (25 +/- 5 ppm, 24 h/day, 7 days/week). Synaptic density in rats exposed to halothane was significantly less than in control rats. Animals exposed intermittently to 25 +/- 5 ppm halothane had higher synaptic density than animals exposed continuously to 25 +/- 5 ppm halothane or intermittently to 100 +/- 5 ppm halothane. The latter two exposure conditions exerted similar effects. The lag in synaptic development was established at 5 days postnatal and remained the same throughout the first 95 postnatal days in both the entorhinal cortex and subiculum. Delayed synaptogenesis caused by halothane was indicated by the presence of growth cones in halothane-exposed rats to 34 days compared with 21 days in the control rats. The spontaneous alternation test indicated that the delayed synaptogenesis by halothane was sufficient to suppress behavioral development. Thus, the delay in the initial synaptic maturation caused by halothane exposure in utero may result in permanent morphologic and functional deficits of the brain.
在出生后第5、21、34和95天对大鼠的内嗅皮质和海马下托的突触密度进行了定量分析。这些大鼠是其母亲在妊娠期和出生后60天内接受四种不同浓度氟烷处理后的后代。暴露条件为对照组、间歇性氟烷(25±5 ppm或100±5 ppm,每天8小时,每周5天)和持续性氟烷(25±5 ppm,每天24小时,每周7天)。暴露于氟烷的大鼠的突触密度明显低于对照大鼠。间歇性暴露于25±5 ppm氟烷的动物比持续性暴露于25±5 ppm氟烷或间歇性暴露于100±5 ppm氟烷的动物具有更高的突触密度。后两种暴露条件产生了相似的效果。突触发育的延迟在出生后5天就已确定,并且在内嗅皮质和海马下托中,在出生后的前95天内都保持不变。与对照大鼠在出生后21天相比,暴露于氟烷的大鼠到34天时仍存在生长锥,这表明氟烷导致了突触发生延迟。自发交替试验表明,氟烷引起的突触发生延迟足以抑制行为发育。因此,子宫内暴露于氟烷导致的初始突触成熟延迟可能会导致大脑永久性的形态和功能缺陷。