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用于高性能日间辐射冷却的经济高效无机多层膜

Cost-Effective Inorganic Multilayer Film for High-Performance Daytime Radiative Cooling.

作者信息

Liu Huan, Yang Yingxin, Ambar Atsha, Fan Zhiqiang, Sun Ying, Wang Cong

机构信息

School of Energy and Power Engineering, Beihang University, Beijing 100191, China.

School of Physics, Beihang University, Beijing 100191, China.

出版信息

Materials (Basel). 2025 Apr 10;18(8):1729. doi: 10.3390/ma18081729.

Abstract

Inorganic multilayer films for radiative cooling have garnered significant attention due to their exceptional resistance to photothermal degradation. However, the design and fabrication of structurally simple and cost-effective inorganic multilayer films remain challenging due to limitations in material properties and the preparation process. This study develops a structurally simple inorganic multilayer film (SiN/SiO/AlO/SiN/Al) for daytime radiative cooling. Instead of the conventional periodic alternation of high and low refractive indices (H-L…H-L), this work proposes a H-L-L-H symmetric multilayer film structure to achieve improved radiative cooling performance. The fabricated multilayer film demonstrates superior radiative cooling properties and lower thickness than that in the current studies using Al as the reflective layer, achieving a solar reflectance of 89.57%, an atmospheric window (8-13 μm) emissivity of 83.41%, and a net cooling power of 63.38 W·m. Under direct sunlight, the multilayer film demonstrated a maximum temperature reduction of approximately 3 °C compared to the reference sample. By employing a thermal treatment process for the SiN layer, the poor adhesion between the Al layer and the SiN layer is successfully addressed without compromising optical performance. The underlying physical mechanisms are also elucidated. This work provides an effective strategy for developing daytime radiative cooling inorganic multilayer films suitable for large-scale industrial production.

摘要

用于辐射冷却的无机多层膜因其对光热降解的卓越抗性而备受关注。然而,由于材料性能和制备工艺的限制,设计和制造结构简单且成本效益高的无机多层膜仍然具有挑战性。本研究开发了一种用于日间辐射冷却的结构简单的无机多层膜(SiN/SiO/AlO/SiN/Al)。与传统的高低折射率周期性交替(H-L…H-L)不同,这项工作提出了一种H-L-L-H对称多层膜结构,以实现更好的辐射冷却性能。所制备的多层膜表现出优异的辐射冷却性能,且厚度比目前以Al作为反射层的研究中的膜更薄,实现了89.57%的太阳反射率、83.41%的大气窗口(8-13μm)发射率以及63.38 W·m的净冷却功率。在直射阳光下,与参考样品相比,多层膜的最大降温幅度约为3°C。通过对SiN层采用热处理工艺,成功解决了Al层与SiN层之间附着力差的问题,同时不影响光学性能。还阐明了潜在的物理机制。这项工作为开发适用于大规模工业生产的日间辐射冷却无机多层膜提供了一种有效策略。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/69c6/12028864/9fe5cac3e201/materials-18-01729-g001.jpg

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