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增强种植修复学:无牙下颌编码愈合基台的体外精度

Enhancing Implant Prosthodontics: In Vitro Accuracy of Coded Healing Abutments on the Edentulous Lower Jaw.

作者信息

Vánkos Boldizsár, Palaszkó Dénes, Kelemen Kata, Németh Anna, Schmalzl Judit, Zentai Dániel Márk, Dinya Elek, Hermann Péter, Kispélyi Barbara

机构信息

Department of Prosthodontics, Semmelweis University, Budapest, Hungary.

Institute of Digital Health Sciences, Semmelweis University, Budapest, Hungary.

出版信息

Clin Implant Dent Relat Res. 2025 Jun;27(3):e70036. doi: 10.1111/cid.70036.

Abstract

OBJECTIVE

This study aimed to investigate the accuracy of conventional and digital impression-making and cast-fabrication using coded healing abutments on an edentulous mandibular model under in vitro conditions.

MATERIALS AND METHODS

Our study investigated the accuracy of the On1 Concept (Nobel Biocare; Kloten, Switzerland) coded healing abutment system using conventional and digital workflows. The Conical Connection (CC) system (Nobel Biocare; Kloten, Switzerland) was used as the control group in both workflows. 10-10 open-tray impressions and intraoral scans were made from the reference model with each system. Models built from intraoral scans were additively fabricated, and open-tray impressions were poured with type-4 dental stone. The prepared models were digitized using a desktop scanner with an accuracy of 4 μm (E4, 3Shape; Copenhagen, Denmark) and superimposed on the reference scan. Four linear distances and root mean square (RMS) deviations were measured using metrology software.

RESULTS

Five dimensions were measured using signed and absolute deviations, resulting in nine outcomes. RMS and diagonal deviations provided the most insight into overall model deviations. Mean RMS deviations were: 58.30 (14.95) μm for CC_conv, 47.66 (13.04) μm for On1_conv, 204.97 (37.40) μm for CC_dig, and 136.64 (13.49) μm for On1_dig. Significant differences were found between On1_conv vs. CC_dig, On1_conv vs. On1_dig, and CC_conv vs. CC_dig. Mean linear deviations between the molar positions were: 24.49 (58.20) μm for CC_conv, 87.46 (106.70) μm for On1_conv, -104.76 (125.83) μm for CC_dig, and 140.64 (190.56) μm for On1_dig. Significant differences were observed between On1_conv vs. CC_dig and CC_dig vs. On1_dig.

CONCLUSIONS

Based on the RMS deviations, the conventional method is significantly more accurate at both implant and platform levels in the case of an in vitro edentulous lower jaw model. The RMS deviations of the implant analogs are smaller on the platform level with both conventional and digital methods.

摘要

目的

本研究旨在调查在体外条件下,使用编码愈合基台在无牙下颌模型上进行传统印模制取与数字化印模制取以及铸型制作的准确性。

材料与方法

我们的研究使用传统和数字化工作流程,调查了On1 Concept(诺贝尔生物保健公司;瑞士克洛滕)编码愈合基台系统的准确性。在两种工作流程中,均使用锥形连接(CC)系统(诺贝尔生物保健公司;瑞士克洛滕)作为对照组。使用每个系统从参考模型制取10-10开放式托盘印模和口内扫描。对口内扫描构建的模型进行增材制造,开放式托盘印模用4型牙科石膏灌注。使用精度为4μm的台式扫描仪(E4,3Shape;丹麦哥本哈根)对制备的模型进行数字化处理,并叠加在参考扫描上。使用计量软件测量四个线性距离和均方根(RMS)偏差。

结果

使用有符号偏差和绝对偏差测量了五个维度,得出九个结果。RMS偏差和对角线偏差最能反映整体模型偏差。平均RMS偏差为:CC_conv为58.30(14.95)μm,On1_conv为47.66(13.04)μm,CC_dig为204.97(37.40)μm,On1_dig为136.64(13.49)μm。在On1_conv与CC_dig、On1_conv与On1_dig以及CC_conv与CC_dig之间发现了显著差异。磨牙位置之间的平均线性偏差为:CC_conv为24.49(58.20)μm,On1_conv为87.46(106.70)μm,CC_dig为-104.76(125.83)μm,On1_dig为140.64(190.56)μm。在On1_conv与CC_dig以及CC_dig与On1_dig之间观察到显著差异。

结论

基于RMS偏差,在体外无牙下颌模型的情况下,传统方法在种植体和平台水平上均明显更准确。在平台水平上,传统方法和数字化方法的种植体代型的RMS偏差均较小。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f1d2/12063562/4fba1a33978f/CID-27-0-g014.jpg

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