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222纳米远紫外线对含氮消毒副产物的光降解作用

Photodegradation of Nitrogenous Disinfection Byproducts by Far-UVC Light at 222 nm.

作者信息

Kim Juhee, Xin Xiaoyue, Kann Ryan J, Li Jiaqi, Labrozzi Aidan S, Xu Jiale, Huang Ching-Hua

机构信息

School of Civil and Environmental Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States.

Department of Civil, Environmental and Construction Engineering, University of Hawaìi at Ma̅noa, Honolulu, Hawaii 96822, United States.

出版信息

ACS ES T Water. 2025 Apr 10;5(5):2619-2629. doi: 10.1021/acsestwater.5c00156. eCollection 2025 May 9.

DOI:10.1021/acsestwater.5c00156
PMID:40371371
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC12070416/
Abstract

Krypton chloride (KrCl*) excimer lamps emitting far-UVC 222 nm light have emerged as a promising alternative technology to conventional low-pressure UV (LPUV) lamps emitting at 254 nm. Herein, the suitability of 222 nm for the photodegradation of 12 haloacetonitrile and haloacetamide disinfection byproducts (DBPs) was investigated. Photolysis of all these nitrogenous DBPs is significantly enhanced at 222 nm, compared to 254 nm. The photolysis rate constants ( = 7.96 × 10 - 1.60 × 10 cm·Einstein) and quantum yields (Φ = 0.049-14.43) are 3-56 and 1.2-4.5 times greater, respectively. The photolysis rate of haloacetamides is faster than that of haloacetonitriles and increases with the number of halogens on DBPs. Bromo-DBPs feature much faster photodegradation than chloro-DBPs within the same structural class. The photolysis rates at 222 nm strongly correlate with DBP molar absorption coefficients (ε) and the energy gap between the highest occupied and the lowest unoccupied orbitals ( - ), indicating the importance of light absorption and photoexcitation. Nitrate and natural organic matter in water cast considerable light-screening effects but also generate reactive species that play a role in the degradation of DBPs at 222 nm. These findings are useful for further developing far-UVC-based technology to mitigate water contamination.

摘要

发射远紫外线C波段222纳米光的氪化氯(KrCl*)准分子灯已成为一种有前景的替代技术,可替代发射254纳米光的传统低压紫外线(LPUV)灯。本文研究了222纳米光对12种卤代乙腈和卤代乙酰胺消毒副产物(DBPs)光降解的适用性。与254纳米光相比,所有这些含氮消毒副产物在222纳米光下的光解作用均显著增强。光解速率常数( = 7.96 × 10 - 1.60 × 10 cm·爱因斯坦)和量子产率(Φ = 0.049 - 14.43)分别提高了3至56倍和1.2至4.5倍。卤代乙酰胺的光解速率比卤代乙腈快,且随着消毒副产物上卤素数量的增加而加快。在同一结构类别中,溴代消毒副产物的光降解速度比氯代消毒副产物快得多。222纳米光下的光解速率与消毒副产物的摩尔吸收系数(ε)以及最高占据轨道和最低未占据轨道之间的能隙( - )密切相关,表明光吸收和光激发的重要性。水中的硝酸盐和天然有机物会产生显著的光屏蔽效应,但也会产生活性物种,这些活性物种在222纳米光下对消毒副产物的降解起作用。这些发现有助于进一步开发基于远紫外线C波段的技术,以减轻水污染。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f114/12070416/f43837b2d66f/ew5c00156_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f114/12070416/06bb0080fa87/ew5c00156_0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f114/12070416/3603d001dea4/ew5c00156_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f114/12070416/1dba9b18999d/ew5c00156_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f114/12070416/f43837b2d66f/ew5c00156_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f114/12070416/06bb0080fa87/ew5c00156_0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f114/12070416/3603d001dea4/ew5c00156_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f114/12070416/1dba9b18999d/ew5c00156_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f114/12070416/f43837b2d66f/ew5c00156_0004.jpg

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本文引用的文献

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Environ Sci Technol. 2024 Oct 1;58(39):17510-17519. doi: 10.1021/acs.est.4c07539. Epub 2024 Sep 19.
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Far-UVC 222 nm Treatment: Effects of Nitrate/Nitrite on Disinfection Byproduct Formation Potential.远紫外线222纳米处理:硝酸盐/亚硝酸盐对消毒副产物生成潜能的影响。
Environ Sci Technol. 2024 Aug 12;58(34):15311-20. doi: 10.1021/acs.est.4c04258.
3
Degradation and Defluorination of Per- and Polyfluoroalkyl Substances by Direct Photolysis at 222 nm.
222纳米直接光解作用下全氟和多氟烷基物质的降解与脱氟
ACS ES T Water. 2023 Jul 6;3(8):2776-2785. doi: 10.1021/acsestwater.3c00274. eCollection 2023 Aug 11.
4
Enhanced Direct Photolysis of Organic Micropollutants by Far-UVC Light at 222 nm from KrCl* Excilamps.由KrCl*准分子灯产生的222纳米远紫外线增强有机微污染物的直接光解作用。
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