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远紫外线222纳米处理:硝酸盐/亚硝酸盐对消毒副产物生成潜能的影响。

Far-UVC 222 nm Treatment: Effects of Nitrate/Nitrite on Disinfection Byproduct Formation Potential.

作者信息

Xu Jiale, Kann Ryan J, Mohammed Dauda, Huang Ching-Hua

机构信息

Department of Civil, Construction and Environmental Engineering, North Dakota State University, Fargo, North Dakota 58102, United States.

School of Civil and Environmental Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States.

出版信息

Environ Sci Technol. 2024 Aug 12;58(34):15311-20. doi: 10.1021/acs.est.4c04258.

Abstract

Irradiation at far ultraviolet C (far-UVC) 222 nm by krypton chloride (KrCl*) excilamps can enhance microbial disinfection and micropollutant photolysis/oxidation. However, nitrate/nitrite, which absorbs strongly at 222 nm, may affect the formation of disinfection byproducts (DBPs). Herein, we evaluated model organic matter and real water samples and observed a substantial increase in the formation potential for trichloronitromethane (chloropicrin) (TCNM-FP), a nitrogenous DBP, by nitrate or nitrite after irradiation at 222 nm. At a disinfection dose of 100 mJ·cm, TCNM-FP of humic acids and fulvic acids increased from ∼0.4 to 25 and 43 μg·L, respectively, by the presence of 10 mg-N·L nitrate. For the effect of nitrate concentration, the TCNM-FP peak was observed at 5-10 mg-N·L. Stronger fluence caused a greater increase of TCNM-FP. Similarly, the increase of TCNM-FP was also observed for wastewater and drinking water samples containing nitrate. Pretreatment using ozonation and coagulation, flocculation, and filtration or the addition of HO can effectively control TCNM-FP. The formation potential of other DBPs was minorly affected by irradiation at 222 nm regardless of whether nitrate/nitrite was present. Overall, far-UVC 222 nm treatment poses the risk of increasing TCNM-FP of waters containing nitrate or nitrite at environmentally relevant concentrations and the mitigation strategies merit further research.

摘要

通过氪氯(KrCl*)准分子灯在远紫外线C(far-UVC)222纳米处进行辐照,可以增强微生物消毒以及微污染物的光解/氧化。然而,在222纳米处有强烈吸收的硝酸盐/亚硝酸盐可能会影响消毒副产物(DBP)的形成。在此,我们评估了模型有机物和实际水样,发现在222纳米处辐照后,硝酸盐或亚硝酸盐会使含氮消毒副产物三氯硝基甲烷(氯化苦)(TCNM-FP)的生成潜力大幅增加。在100 mJ·cm的消毒剂量下,由于存在10 mg-N·L的硝酸盐,腐殖酸和富里酸的TCNM-FP分别从约0.4微克/升增加到25微克/升和43微克/升。对于硝酸盐浓度的影响,在5-10 mg-N·L时观察到TCNM-FP峰值。更强的辐照通量导致TCNM-FP增加幅度更大。同样,在含硝酸盐的废水和饮用水样本中也观察到了TCNM-FP的增加。使用臭氧氧化以及混凝、絮凝和过滤进行预处理或添加羟基自由基(HO)可以有效控制TCNM-FP。无论是否存在硝酸盐/亚硝酸盐,222纳米处的辐照对其他消毒副产物的生成潜力影响较小。总体而言,222纳米的远紫外线C处理存在增加环境相关浓度下含硝酸盐或亚硝酸盐水体中TCNM-FP的风险,缓解策略值得进一步研究。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2745/11360365/041e94796953/es4c04258_0001.jpg

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