Zhang Jiangshi, Wang Yanan, Jia Hongfu, Wang Kai, Jia Yulu, Ren Xiaofeng, Li Yongtun, Tong Linquan
School of Emergency Management and Safety Engineering, China University of Mining and Technology-Beijing, Beijing, 100083, China.
School of Safety Science, Tsinghua University, Beijing, 100084, China.
J Mol Model. 2025 May 24;31(6):170. doi: 10.1007/s00894-025-06384-x.
With advancing technology, the hazards of hydrophilic and hydrophobic nano-silica dust have become increasingly apparent. Surfactants are widely used in dust control; however, their performance is primarily determined by their polar groups. To investigate the effect of various polar groups of anionic surfactants on the wettability of hydrophilic and hydrophobic nanosilica. The results indicate that the electronegativity of the electrostatic potential on the hydroxylated silica surface is relatively strong, the larger the electrostatic potential difference (ΔESP) between the surface binding sites and the polar groups of the surfactant, the less favorable the surface is for hydrophobic modification. Additionally, C and O atoms tend to form smaller negative electrostatic potentials compared to S and O atoms, with polar group activity ranked as carboxylate > sulfonate > benzene sulfonate > sulfate. The interaction between SiO2-OH surfaces and water molecules is approximately 3.4 times stronger than that of SiO2-CH3 surfaces. The interaction between water molecules and the SiO2-OH surface is primarily governed by van der Waals forces, whereas the interaction between water molecules and the SiO2-CH3 surface is mainly driven by electrostatic forces. The polar groups of the surfactant are distributed in the aqueous phase, while the nonpolar groups interact with the surface through electrostatic interactions. The hydration layer surrounding the polar groups of hydrophilic surfaces is primarily stabilized by strong hydrogen bonding with water molecules. In contrast, for hydrophobic nano-silica surfaces, the hydration layer is influenced by both van der Waals forces and weaker hydrogen bonding interactions. The SiO2-CH3 surface cannot form hydrogen bonds, while the SiO2-OH surface has a strong capacity to stably form hydrogen bonds with carboxylate and sulfate groups. Hydrogen bonding is an essential factor in wetting. The polar group COO- is suitable for controlling hydrophilic and hydrophobic nano-silica dust. These findings provide theoretical and technical references for the selection, application, and design of surfactants in nano-silica dust control.
To elucidate the effects of various polar groups of anionic surfactants on the wetting of hydrophilic and hydrophobic nano-silica, quantum chemical calculations and molecular dynamics simulations were used to investigate the interfacial adsorption and wetting behavior of anionic surfactants with identical chain lengths but different polar groups on these surfaces.
随着技术的进步,亲水性和疏水性纳米二氧化硅粉尘的危害日益明显。表面活性剂广泛用于粉尘控制;然而,它们的性能主要由其极性基团决定。为了研究阴离子表面活性剂的各种极性基团对亲水性和疏水性纳米二氧化硅润湿性的影响。结果表明,羟基化二氧化硅表面静电势的电负性相对较强,表面结合位点与表面活性剂极性基团之间的静电势差(ΔESP)越大,表面越不利于疏水改性。此外,与硫和氧原子相比,碳和氧原子倾向于形成较小的负静电势,极性基团活性排序为羧酸盐>磺酸盐>苯磺酸盐>硫酸盐。SiO2-OH表面与水分子之间的相互作用比SiO2-CH3表面强约3.4倍。水分子与SiO2-OH表面之间的相互作用主要由范德华力控制,而水分子与SiO2-CH3表面之间的相互作用主要由静电力驱动。表面活性剂的极性基团分布在水相中,而非极性基团通过静电相互作用与表面相互作用。亲水性表面极性基团周围的水化层主要通过与水分子的强氢键作用而稳定。相比之下,对于疏水性纳米二氧化硅表面,水化层受范德华力和较弱的氢键相互作用影响。SiO2-CH3表面不能形成氢键,而SiO2-OH表面具有与羧酸盐和硫酸盐基团稳定形成氢键的强大能力。氢键是润湿性的一个重要因素。极性基团COO-适用于控制亲水性和疏水性纳米二氧化硅粉尘。这些发现为纳米二氧化硅粉尘控制中表面活性剂的选择、应用和设计提供了理论和技术参考。
为了阐明阴离子表面活性剂的各种极性基团对亲水性和疏水性纳米二氧化硅润湿性的影响,采用量子化学计算和分子动力学模拟研究了链长相同但极性基团不同的阴离子表面活性剂在这些表面上的界面吸附和润湿行为。