Xu Xiangrui, Huang Junjie, Miao Gesong, Yan Bo, Chen Yangbo, Zhou Yinghui, Zhang Yufeng, Zhang Xueao, Cai Weiwei
College of Physical Science and Technology, Xiamen University, Xiamen 361005, China.
Jiujiang Research Institute of Xiamen University, Jiujiang 360404, China.
Materials (Basel). 2025 May 11;18(10):2222. doi: 10.3390/ma18102222.
The reduction of graphene oxide (GO) is critical for tuning its properties. This study integrates optical contrast analysis with Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) to investigate the structural and optical evolution of GO in thermal reduction. For GO on 100 nm SiO/Si, the R channel contrast exhibits superior sensitivity to structural changes, making it a reliable indicator of the reduction process. A theoretical model based on Fresnel equations reveals the role of SiO thickness in modulating optical contrast, providing guidelines for substrate optimization and channel selection.
氧化石墨烯（GO）的还原对于调节其性能至关重要。本研究将光学对比度分析与拉曼光谱和X射线光电子能谱（XPS）相结合，以研究热还原过程中GO的结构和光学演变。对于100 nm SiO/Si上的GO，R通道对比度对结构变化表现出卓越的敏感性，使其成为还原过程的可靠指标。基于菲涅耳方程的理论模型揭示了SiO厚度在调节光学对比度中的作用，为衬底优化和通道选择提供了指导。
