Oh Gyujin, Kim Seon Pil, Lee Kyoung Su, Kim Eun Kyu
Quantum-Function Research Laboratory, Department of Physics, Hanyang University, 222 Wangsimni-Ro, Seongdong-Gu, Seoul 133-791, Korea.
J Nanosci Nanotechnol. 2013 Oct;13(10):7149-51. doi: 10.1166/jnn.2013.7801.
We have studied the structural and optical properties of indium tin oxide (ITO) films deposited on sapphire substrates by electron beam evaporator with glancing angle deposition method. The ITO films were grown with different deposition angles of 0 degrees, 30 degrees, 45 degrees, 60 degrees at fixed deposition rate of 3 angstroms/s and with deposition rates of 2 angstroms/s, 3 angstroms/s, and 4angstroms/s at deposition angle of 45 degrees, respectively. From analysis of ellipsometry measurements, it appears that the void fraction of the films increased and their refractive indices decreased from 2.18 to 1.38 at the wavelength of 500 as increasing the deposition angle. The refractive index in the wavelength ranges of 550 nm-800 nm also depends on the deposition rates. Transmittance of ITO film with 235-nm-thickness grown at 60 degrees was covered about 20-80%, and then it was increased in visible wavelength range with increase of deposition angle.
我们利用电子束蒸发器，采用掠角沉积法研究了沉积在蓝宝石衬底上的氧化铟锡（ITO）薄膜的结构和光学性质。ITO薄膜在固定沉积速率为3埃/秒的情况下，分别以0度、30度、45度、60度的不同沉积角度生长；在沉积角度为45度时，分别以2埃/秒、3埃/秒和4埃/秒的沉积速率生长。通过椭偏测量分析可知，随着沉积角度的增加，薄膜的孔隙率增加，其折射率在500纳米波长处从2.18降至1.38。在550纳米至800纳米波长范围内，折射率也取决于沉积速率。在60度生长的厚度为235纳米的ITO薄膜的透过率约为20%-80%，然后在可见光波长范围内随着沉积角度的增加而增大。
