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与基于真空的技术相比,自适应足部矫形鞋垫便于操作并降低足底压力。

Self-Adapting Foot Orthosis Inlay Facilitates Handling and Reduces Plantar Pressure Compared to Vacuum-Based Technology.

作者信息

Milstrey Alexander, Horst Carolin, Gartung Stella, Weigel Ann-Sophie, Stange Richard, Ochman Sabine

机构信息

Department of Trauma-, Hand- and Reconstructive Surgery, University Hospital Muenster, 48149 Muenster, Germany.

Department of Regenerative Musculoskeletal Medicine, Institute of Musculoskeletal Medicine (IMM), University Hospital Muenster, 48149 Muenster, Germany.

出版信息

J Clin Med. 2025 May 13;14(10):3384. doi: 10.3390/jcm14103384.

DOI:10.3390/jcm14103384
PMID:40429381
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC12112748/
Abstract

: Orthoses are commonly used in the treatment of various foot and ankle injuries and deformities. An effective technology in foot orthoses is a vacuum system to improve the fit and function of the orthosis. Recently, a new technology was designed to facilitate the wearing of the foot orthoses while maintaining function without the need for vacuum suction. : A plantar dynamic pressure distribution measurement was carried out in 25 healthy subjects (13 w/12 m, age 23-58 y) using capacitive measuring insoles in two differently designed inlays within the VACOpedes orthosis (Group A: vacuum inlay vs. Group B: XELGO inlay) and a regular off-the-shelf shoe (Group C, OTS). The peak plantar pressure, mean plantar pressure and maximum force were analyzed in the entire foot and in individual regions of the medial and lateral forefoot, the midfoot and the hindfoot. Finally, the wearing comfort was compared using a visual analog scale from 1 to 10 (highest comfort). : The peak pressure of both inlays was significantly lower than in the OTS shoe (A: 230.6 ± 44.6 kPa, B: 218.0 ± 49.7 kPa, C: 278.6 ± 50.5 kPa; < 0.001). In a sub-analysis of the different regions, the XELGO inlay significantly reduced plantar pressure in the medial forefoot compared to the vacuum orthosis (A: 181.7 ± 45.7 kPa, B: 158.6 ± 51.7 kPa, < 0.002). The wearing comfort was significantly higher with the XELGO inlay compared to the vacuum inlay (A: 5.68/10, B: 7.24/10; < 0.001). : The VACOpedes orthosis with a new XELGO inlay showed at least equivalent relief in all pressure distribution measurements analyzed and greater relief in the forefoot area than the VACOpedes orthosis with a vacuum inlay, as well as increased wearing comfort.

摘要

矫形器常用于治疗各种足踝损伤和畸形。足部矫形器中的一项有效技术是真空系统,以改善矫形器的贴合度和功能。最近,设计了一种新技术,在无需真空抽吸的情况下,既能便于穿戴足部矫形器,又能保持其功能。

对25名健康受试者(13名男性/12名女性,年龄23 - 58岁)进行了足底动态压力分布测量,使用电容式测量鞋垫,置于VACOpedes矫形器内两种不同设计的鞋垫中(A组:真空鞋垫 vs. B组:XELGO鞋垫)以及一双常规的现成鞋子(C组,OTS)。分析了整个足部以及前足内侧和外侧、中足和后足各个区域的足底峰值压力、平均足底压力和最大力。最后,使用1至10的视觉模拟量表(最高舒适度)比较了穿着舒适度。

两种鞋垫的峰值压力均显著低于OTS鞋(A组:230.6 ± 44.6 kPa,B组:218.0 ± 49.7 kPa,C组:278.6 ± 50.5 kPa;P < 0.001)。在不同区域的亚分析中,与真空矫形器相比,XELGO鞋垫在前足内侧显著降低了足底压力(A组:181.7 ± 45.7 kPa,B组:158.6 ± 51.7 kPa,P < 0.002)。与真空鞋垫相比,XELGO鞋垫的穿着舒适度显著更高(A组:5.68/10,B组:7.24/10;P < 0.001)。

带有新型XELGO鞋垫的VACOpedes矫形器在所有分析的压力分布测量中显示出至少相当的减压效果,并且在前足区域比带有真空鞋垫的VACOpedes矫形器减压效果更好,同时穿着舒适度也有所提高。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/973d3d78433b/jcm-14-03384-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/8f5d512d26b7/jcm-14-03384-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/5d6c5e179988/jcm-14-03384-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/697d1cfa0143/jcm-14-03384-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/7692090174f7/jcm-14-03384-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/99e9559925f9/jcm-14-03384-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/f692ce8b2a03/jcm-14-03384-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/bc146194be90/jcm-14-03384-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/3f526f77a888/jcm-14-03384-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/973d3d78433b/jcm-14-03384-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/8f5d512d26b7/jcm-14-03384-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/5d6c5e179988/jcm-14-03384-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/697d1cfa0143/jcm-14-03384-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/7692090174f7/jcm-14-03384-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/99e9559925f9/jcm-14-03384-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/f692ce8b2a03/jcm-14-03384-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/bc146194be90/jcm-14-03384-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/3f526f77a888/jcm-14-03384-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52af/12112748/973d3d78433b/jcm-14-03384-g009.jpg

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