Jin Congcong, Li Yang, Kim Jin Seong, Lim Jong-Hoon, Huang Hongbo, Chen Chong-An, Lee Jihyun, Heo Yejin, Zhang Bingbing, Jang Joon Ik, Ok Kang Min
Center for Noncentrosymmetric Materials, Department of Chemistry, Sogang University, Seoul, 04107, Republic of Korea.
Department of Physics, Sogang University, Seoul, 04107, Republic of Korea.
Angew Chem Int Ed Engl. 2025 Sep 1;64(36):e202512618. doi: 10.1002/anie.202512618. Epub 2025 Jul 9.
Partial fluorination of oxides has positioned oxyfluorides as a promising class of nonlinear optical (NLO) materials owing to their balanced optical properties. However, effectively arranging optical chromophores to achieve strong optical nonlinearity remains challenging. In this study, we explore the structural chemistry of [NbOF] chain-based oxyfluoroniobates and establish a molecular geometric framework to quantify key structural fingerprint factors, namely, the ∠(O─Nb─O') bond angle, χ[F,Nb,Nb',F'] torsion angle, chain alignment, and distortion of [NbOF] nodes. Theoretical calculations confirm that these factors critically influence second harmonic generation (SHG) activity. By integrating π-conjugated biuret (CHNO) molecules with optimally aligned [NbOF] chains, we synthesized (HO)(Biu)(NbOF) (Biu = biuret), a crystal exhibiting a record-breaking SHG response, reaching 10.8 times that of KHPO, among transition metal (TM) oxyfluorides. Its moderate birefringence (Δn = 0.062 @1064 nm) and wide band gap (E = 4.50 eV) further support its potential as a high-performance ultraviolet (UV) NLO material. These results highlight the power of structural fingerprint optimization in fully activating polar chains and offer a new strategy for designing next-generation UV NLO crystals with enhanced SHG performance.
氧化物的部分氟化使氧氟化物成为一类有前途的非线性光学(NLO)材料,因其具有平衡的光学性质。然而,有效地排列光学发色团以实现强光学非线性仍然具有挑战性。在本研究中,我们探索了基于[NbOF]链的氧氟铌酸盐的结构化学,并建立了一个分子几何框架来量化关键的结构指纹因素,即∠(O─Nb─O')键角、χ[F,Nb,Nb',F']扭转角、链排列以及[NbOF]节点的畸变。理论计算证实这些因素对二次谐波产生(SHG)活性有至关重要的影响。通过将π共轭缩二脲(CHNO)分子与最佳排列的[NbOF]链整合,我们合成了(HO)(Biu)(NbOF)(Biu = 缩二脲),这是一种晶体,其SHG响应打破记录,在过渡金属(TM)氧氟化物中达到磷酸二氢钾的10.8倍。其适度的双折射(Δn = 0.062 @1064 nm)和宽带隙(E = 4.50 eV)进一步支持了其作为高性能紫外(UV)NLO材料的潜力。这些结果突出了结构指纹优化在充分激活极性链方面的作用,并为设计具有增强SHG性能的下一代UV NLO晶体提供了新策略。