Jafari Monireh, Shahidi Mohammad Mahdi, Ehsani Mohammad Hossein
Faculty of Physics, Semnan University, Semnan, Iran.
UNESCO-UNISA-ITL/NRF Africa Chair in Nanoscience and Nanotechnology (U2ACN2), College of Graduate Studies, University of South Africa (UNISA), P.O. Box 392, Muckleneuk Ridge, Pretoria, South Africa.
Sci Rep. 2025 Jul 1;15(1):21561. doi: 10.1038/s41598-025-08916-0.
The WS thin films were deposited on glass substrates with RF magnetron sputtering using a WS target to study the effect of substrate temperature (25, 100, 200, and 300 °C) on their properties. In this study, we investigated the morphological, structural, and optical characteristics of the films. FESEM images show that all the samples consist of nanoparticles, with the exception of the film deposited at 200 °C, which uniquely exhibited a nanosheet morphology. The AFM spectrum of the samples determined that the sample with a substrate temperature of 200 °C had the highest roughness, which confirms the results obtained from the FESEM images of the samples. The XRD patterns of all the thin films showed the preferred orientation (104) related to the WS phase, and among the samples, the film deposited at 200 °C exhibited the largest crystallite size and the lowest strains. Also, no additional peak related to the oxide phase was observed in XRD and Raman spectra. The band gap of the 200 °C sample was lower than the other samples, and because it has a larger crystal size, this can be caused by quantum confinement. At 200 °C, the resistivity reached its highest value, accompanied by a significant decrease in carrier mobility and concentration, likely due to structural disorder and increased porosity in this sample.
使用WS靶材通过射频磁控溅射在玻璃基板上沉积WS薄膜，以研究基板温度（25、100、200和300°C）对其性能的影响。在本研究中，我们研究了薄膜的形态、结构和光学特性。场发射扫描电子显微镜（FESEM）图像显示，除了在200°C下沉积的薄膜独特地呈现出纳米片形态外，所有样品均由纳米颗粒组成。样品的原子力显微镜（AFM）光谱确定，基板温度为200°C的样品粗糙度最高，这证实了从样品的FESEM图像获得的结果。所有薄膜的X射线衍射（XRD）图谱均显示出与WS相相关的择优取向（104），并且在样品中，在200°C下沉积的薄膜表现出最大的微晶尺寸和最低的应变。此外，在XRD和拉曼光谱中未观察到与氧化物相相关的额外峰。200°C样品的带隙低于其他样品，并且由于其具有更大的晶体尺寸，这可能是由量子限制引起的。在200°C时，电阻率达到其最高值，同时载流子迁移率和浓度显著降低，这可能是由于该样品中的结构无序和孔隙率增加所致。
