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基于氮化硅槽波导结构的偏振无关型1×2光功率分配器的设计

Design of polarization-independent 1 × 2 optical power splitter based on silicon nitride slot waveguide structure.

作者信息

Liu Fangxu, Lv Huanlin, Zhang Hongyu, Liu Shuo, Liang Yanfeng, Wang Haoyu, Cong Yang, Li Xuanchen, Guo Qingxiao

机构信息

School of Information Science and Engineering, Dalian Polytechnic University, Dalian, 116034, China.

Department of General Education, Dalian Polytechnic University, Dalian, 116034, China.

出版信息

Sci Rep. 2025 Jul 13;15(1):25288. doi: 10.1038/s41598-025-11404-0.

Abstract

This paper introduces a novel design of a three-layer slot waveguide structure, serving as a polarization-independent optical power splitter based on Si/SiN/Si materials. This design addresses the common challenges of structural complexity and high loss typically encountered in most polarization-independent optical power splitters. It achieves successful 1 × 2 power splitting for 1550 nm optical signals. The refractive index of the SiN layer is tunable through the ion-assisted deposition method, which enables the alignment of output image points for both transverse electric (TE) and transverse magnetic (TM) modes, thereby achieving polarization-independent performance. The width of the Multimode Interference (MMI) region is reasonably selected to balance between device size and loss ensuring optimal performance. Additionally, an optimized tapered waveguide design has been incorporated to effectively reduce insertion loss. The device is simulated using the Frequency Domain Finite Difference (FDE) method and the Eigenmode Expansion (EME) method. Simulation results show that the coupling region of the device measures 4 μm×15.6 μm, with insertion losses for both TE and TM polarization modes below 0.034 dB at 1550 nm, and below 0.175 dB over a 100 nm bandwidth. This optical power splitter design holds significant potential for future integrated optical path applications.

摘要

本文介绍了一种基于Si/SiN/Si材料的三层槽波导结构的新颖设计,该结构用作偏振无关型光功率分配器。这种设计解决了大多数偏振无关型光功率分配器通常遇到的结构复杂和高损耗等常见挑战。它成功实现了1550nm光信号的1×2功率分配。SiN层的折射率可通过离子辅助沉积方法进行调谐,这使得横向电(TE)模式和横向磁(TM)模式的输出像点能够对齐,从而实现偏振无关性能。合理选择多模干涉(MMI)区域的宽度,以在器件尺寸和损耗之间取得平衡,确保最佳性能。此外,还采用了优化的锥形波导设计,以有效降低插入损耗。该器件使用频域有限差分(FDE)方法和本征模展开(EME)方法进行模拟。模拟结果表明,该器件的耦合区域尺寸为4μm×15.6μm,在1550nm处,TE和TM偏振模式的插入损耗均低于0.034dB,在100nm带宽内低于0.175dB。这种光功率分配器设计在未来的集成光路应用中具有巨大潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/409d/12255730/b1e194cc7a1d/41598_2025_11404_Fig1_HTML.jpg

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