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离子束电流对TiO涂层结构、光学和力学性能的影响:离子束辅助与传统电子束蒸发的比较

Influence of ion beam current on the structural, optical, and mechanical properties of TiO coatings: ion beam-assisted vs conventional electron beam evaporation.

作者信息

Obstarczyk Agata, Wawrzaszek Urszula

机构信息

Wroclaw University of Science & Technology, Faculty of Electronics, Photonics and Microsystems, Janiszewskiego 11/17, 50-372 Wroclaw, Poland.

出版信息

Beilstein J Nanotechnol. 2025 Jul 14;16:1097-1112. doi: 10.3762/bjnano.16.81. eCollection 2025.

DOI:10.3762/bjnano.16.81
PMID:40692895
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC12278109/
Abstract

In this paper, comparative studies of selected properties of titanium dioxide (TiO) coatings deposited using electron beam evaporation (EBE) and ion beam-assisted deposition (IBAD) are presented. Post-process annealing at 800 °C was also conducted to examine its impact on the properties of the prepared coatings. After annealing at 800 °C, a transition from amorphous to the anatase phase occurred for all coatings. In particular, an increase in ion beam current led to a reduction in crystallite size by approximately 30% compared to coatings prepared by conventional EBE process. The average anatase crystallite size for annealed films was in the range of 30.8 to 43.5 nm. A detailed SEM analysis of surface morphology and cross sections revealed that the TiO films prepared by IBAD had smaller, rounded grains and were denser compared to those deposited by EBE. Optical properties showed high transparency of 77-83% in the visible wavelength range for all as-prepared thin films. However, annealing caused a decrease of the transparency level by 32% for films deposited by EBE, while for films from the IBAD process the decrease was less than 10%. The use of an ion gun increased the hardness of the TiO films from 2.4 to 3.5 GPa ( = 4 A). Although a similar relationship was observed for coatings after annealing, hardness values were lower than for as-deposited coatings. The most notable differences were observed in the abrasion tests, where the IBAD process significantly enhanced the abrasion resistance of the coatings. This research highlights the potential of IBAD to prepare dense, adhesive, and durable TiO coatings with improved optical and mechanical properties, suitable for applications requiring enhanced wear resistance.

摘要

本文介绍了使用电子束蒸发(EBE)和离子束辅助沉积(IBAD)方法制备的二氧化钛(TiO)涂层选定性能的比较研究。还进行了800°C的后处理退火,以研究其对制备涂层性能的影响。在800°C退火后,所有涂层均发生了从非晶态到锐钛矿相的转变。特别是,与传统EBE工艺制备的涂层相比,离子束电流的增加导致微晶尺寸减小了约30%。退火薄膜的平均锐钛矿微晶尺寸在30.8至43.5nm范围内。对表面形貌和横截面的详细扫描电子显微镜(SEM)分析表明,与EBE沉积的TiO薄膜相比,IBAD制备的TiO薄膜具有更小、更圆的晶粒,且更致密。光学性能表明,所有制备的薄膜在可见光波长范围内具有77-83%的高透明度。然而,退火使EBE沉积的薄膜透明度水平降低了32%,而对于IBAD工艺制备的薄膜,透明度降低小于10%。使用离子枪使TiO薄膜的硬度从2.4 GPa提高到3.5 GPa(离子束电流 = 4 A)。尽管退火后的涂层也观察到类似的关系,但硬度值低于沉积态涂层。在磨损试验中观察到最显著的差异,其中IBAD工艺显著提高了涂层的耐磨性。本研究突出了IBAD在制备具有改善光学和机械性能的致密、附着力强且耐用的TiO涂层方面的潜力,适用于需要增强耐磨性的应用。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/d9def3a2a752/Beilstein_J_Nanotechnol-16-1097-g011.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/cf01d0a41c0c/Beilstein_J_Nanotechnol-16-1097-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/7504360ac85d/Beilstein_J_Nanotechnol-16-1097-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/a7ee1b13f747/Beilstein_J_Nanotechnol-16-1097-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/fb95055a3f18/Beilstein_J_Nanotechnol-16-1097-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/6e20861416d5/Beilstein_J_Nanotechnol-16-1097-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/1f8d6dbd8c96/Beilstein_J_Nanotechnol-16-1097-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/788234a41d8c/Beilstein_J_Nanotechnol-16-1097-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/835e7b3b015a/Beilstein_J_Nanotechnol-16-1097-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/8f93939a4e40/Beilstein_J_Nanotechnol-16-1097-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/d9def3a2a752/Beilstein_J_Nanotechnol-16-1097-g011.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/cf01d0a41c0c/Beilstein_J_Nanotechnol-16-1097-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/7504360ac85d/Beilstein_J_Nanotechnol-16-1097-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/a7ee1b13f747/Beilstein_J_Nanotechnol-16-1097-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/fb95055a3f18/Beilstein_J_Nanotechnol-16-1097-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/6e20861416d5/Beilstein_J_Nanotechnol-16-1097-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/1f8d6dbd8c96/Beilstein_J_Nanotechnol-16-1097-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/788234a41d8c/Beilstein_J_Nanotechnol-16-1097-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/835e7b3b015a/Beilstein_J_Nanotechnol-16-1097-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/8f93939a4e40/Beilstein_J_Nanotechnol-16-1097-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/636c/12278109/d9def3a2a752/Beilstein_J_Nanotechnol-16-1097-g011.jpg

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