Silva Vitor, Colmiais Ivo, Dinis Hugo, Borme Jérôme, Alpuim Pedro, Mendes Paulo M
CMEMS-Center for Microelectromechanical Systems, University of Minho, Campus de Azurém, 4800-058 Guimarães, Portugal.
LABBELS-Associate Laboratory, 4710-057 Braga, Portugal.
Nanomaterials (Basel). 2025 Jul 18;15(14):1119. doi: 10.3390/nano15141119.
Two-dimensional (2D) materials have been proposed for use in a multitude of applications, with graphene being one of the most well-known 2D materials. Despite their potential to contribute to innovative solutions, the fabrication of such devices still faces significant challenges. One of the key challenges is the fabrication at a wafer-level scale, a fundamental step for allowing reliable and reproducible fabrication of a large volume of devices with predictable properties. Overcoming this barrier will allow further integration with sensors and actuators, as well as enabling the fabrication of complex circuits based on 2D materials. This work presents the fabrication steps for a process that allows the on-wafer fabrication of active and passive radiofrequency (RF) devices enabled by graphene. Two fabrication processes are presented. In the first one, graphene is transferred to a back gate surface using critical point drying to prevent cracks in the graphene. In the second process, graphene is transferred to a flat surface planarized by ion milling, with the gate being buried beneath the graphene. The fabrication employs a damascene-like process, ensuring a flat surface that preserves the graphene lattice. RF transistors, passive RF components, and antennas designed for backscatter applications are fabricated and measured, illustrating the versatility and potential of the proposed method for 2D material-based RF devices. The integration of graphene on devices is also demonstrated in an antenna. This aimed to demonstrate that graphene can also be used as a passive device. Through this device, it is possible to measure different backscatter responses according to the applied graphene gating voltage, demonstrating the possibility of wireless sensor development. With the proposed fabrication processes, a flat graphene with good quality is achieved, leading to the fabrication of RF active devices (graphene transistors) with intrinsic f and f of 14 GHz and 80 GHz, respectively. Excellent yield and reproducibility are achieved through these methods. Furthermore, since the graphene membranes are grown by Chemical Vapor Deposition (CVD), it is expected that this process can also be applied to other 2D materials.
二维(2D)材料已被提议用于众多应用中,石墨烯是最著名的二维材料之一。尽管它们有潜力促成创新解决方案,但此类器件的制造仍面临重大挑战。关键挑战之一是晶圆级规模的制造,这是可靠且可重复地制造大量具有可预测特性的器件的基本步骤。克服这一障碍将允许与传感器和致动器进一步集成,并能够制造基于二维材料的复杂电路。这项工作展示了一种工艺的制造步骤,该工艺允许在晶圆上制造由石墨烯实现的有源和无源射频(RF)器件。介绍了两种制造工艺。在第一种工艺中,使用临界点干燥将石墨烯转移到背栅表面,以防止石墨烯出现裂纹。在第二种工艺中,将石墨烯转移到通过离子铣削平面化的平坦表面上,栅极埋在石墨烯下方。该制造采用类似镶嵌的工艺,确保表面平坦,保留石墨烯晶格。制造并测量了用于反向散射应用的射频晶体管、无源射频组件和天线,说明了所提出的基于二维材料的射频器件方法的多功能性和潜力。还在一个天线中展示了石墨烯在器件上的集成。这旨在证明石墨烯也可以用作无源器件。通过该器件,可以根据施加的石墨烯栅极电压测量不同的反向散射响应,证明了无线传感器开发的可能性。通过所提出的制造工艺,获得了高质量的平坦石墨烯,从而制造出本征f和f分别为14 GHz和80 GHz的射频有源器件(石墨烯晶体管)。通过这些方法实现了优异的成品率和可重复性。此外,由于石墨烯膜是通过化学气相沉积(CVD)生长的,预计该工艺也可应用于其他二维材料。