Chen Zhi, Zhong Lijing, Sun Xiangyu, Fu Yihui, He Huilin, Ji Huijiao, Wang Yuying, Liu Xiaofeng, Xu Beibei, Wu Zhemin, Zou Chen, Ma Zhijun, Zhang Jingyu, Dong Guoping, Barillaro Giuseppe, Qiu Cheng-Wei, Qiu Jianbei, Qiu Jianrong
College of Materials Science and Engineering, Key Laboratory of Advanced Materials of Yunnan Province, Kunming University of Science and Technology, Kunming, China.
Institute of Light+X Science and Technology, College of Information Science and Engineering, Ningbo University, Ningbo, China.
Nat Commun. 2025 Aug 12;16(1):7434. doi: 10.1038/s41467-025-62426-1.
One of the major challenges in the rapidly advancing field of nanophotonics is creating high-aspect-ratio nanostructures over large-area with consistent precision. Traditional techniques like photolithography and etching fall short, being limited to fabricating structures with a typical feature size of 100 nm and a maximum aspect ratio of 30:1. To break through these barriers, herein we introduce a strategy, called wet-chemical etching assisted aberration-enhanced single-pulsed femtosecond laser-supplemented nanolithography (WEALTH), for manufacturing large-area deep holey nanostructures. This strategy enables fabrication of nanostructures with diameters as small as 25 nm (exceeding 1/30 of Abbe's diffraction limit), aspect ratios greater than 10:1, and large-area holey lattices spanning 10 mm with potential scalability up to several cm. We have successfully harnessed this technique to develop cutting-edge applications, including immunoassay biosensing chips, large-area nanophotonic crystals, nanophotonic crystal microcavities, and chiral nanophotonic devices. Moreover, it is adaptable to a wide range of materials, including crystals, glasses, and silicon-based semiconductors. Our approach offers high flexibility in customizing large-area holey nanophotonic structures, paving the way for breakthrough advancements in 3D integrated optics.
在快速发展的纳米光子学领域，主要挑战之一是在大面积上精确制造高纵横比的纳米结构。光刻和蚀刻等传统技术存在不足，只能制造特征尺寸典型为100纳米、最大纵横比为30:1的结构。为突破这些障碍，我们在此引入一种名为湿化学蚀刻辅助像差增强单脉冲飞秒激光补充纳米光刻（WEALTH）的策略，用于制造大面积深孔纳米结构。该策略能够制造直径小至25纳米（超过阿贝衍射极限的1/30）、纵横比大于10:1且大面积多孔晶格跨度达10毫米且潜在可扩展至几厘米的纳米结构。我们已成功利用该技术开发前沿应用，包括免疫分析生物传感芯片、大面积纳米光子晶体、纳米光子晶体微腔和手性纳米光子器件。此外，它适用于多种材料，包括晶体、玻璃和硅基半导体。我们的方法在定制大面积多孔纳米光子结构方面具有高度灵活性，为三维集成光学的突破性进展铺平了道路。
