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纳米尺度下六方氮化硼中硼空位浓度的观察

Observation of Boron Vacancy Concentration in Hexagonal Boron Nitride at Nanometer Scale.

作者信息

Kikkawa Jun, Shinei Chikara, Chen Jun, Masuyama Yuta, Yamazaki Yuichi, Mizoguchi Teruyasu, Kimoto Koji, Taniguchi Takashi, Teraji Tokuyuki

机构信息

National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan.

National Institutes for Quantum Science and Technology, 1233 Watanukimachi, Takasaki 370-1292, Japan.

出版信息

Nano Lett. 2025 Sep 3;25(35):13191-13197. doi: 10.1021/acs.nanolett.5c02988. Epub 2025 Aug 20.

Abstract

Negatively charged boron vacancy (V) ensembles in hexagonal boron nitride (h-BN) have attracted considerable attention as a promising platform for quantum sensing. Current challenges include the experimental validation of the spatial distribution and electronic states of optically active V and optically inactive neutral boron vacancy (V) defects. To address these issues, we employ electron energy loss spectroscopy (EELS) combined with scanning transmission electron microscopy (STEM) using monochromated 30-keV electrons, effectively reducing background interference. This approach unveils distinct spectral peaks at 2.5 and 1.9 eV, corresponding to V and V defects, respectively. Furthermore, we achieve nanometer-scale concentration mapping for V and V defects, advancing insights into spin defect configurations crucial for optimizing quantum sensor performance.

摘要

六方氮化硼(h-BN)中带负电荷的硼空位(V)团簇作为一种很有前景的量子传感平台,已引起了广泛关注。当前的挑战包括对光学活性V和光学非活性中性硼空位(V)缺陷的空间分布和电子态进行实验验证。为了解决这些问题,我们采用电子能量损失谱(EELS)并结合使用单色30 keV电子的扫描透射电子显微镜(STEM),有效减少了背景干扰。这种方法揭示了分别对应于V和V缺陷的2.5和1.9 eV处的独特光谱峰。此外,我们实现了V和V缺陷的纳米级浓度映射,从而加深了对优化量子传感器性能至关重要的自旋缺陷构型的理解。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2cb9/12412148/d0f835732eae/nl5c02988_0001.jpg

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