Peng Lin, Wu Junhui, Zheng Shujun, Liu Hongjie, Xiong Ruying, Chen Xueyan, Zheng Xu, Lin Xiao, Tan Xiaodi
College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou 350117, China.
Information Photonics Research Center, Key Laboratory of Optoelectronic Science and for Medicine of Ministry of Education, Fujian Provincial Key Laboratory of Photonics Technology, Fujian Provincial Engineering Technology Research Center of Photoelectric Sensing Application, Fujian Normal University, Fuzhou 350117, China.
Polymers (Basel). 2025 Aug 27;17(17):2321. doi: 10.3390/polym17172321.
Photopolymer PQ/PMMA, as a pivotal material in the field of holographic storage, demonstrates significant application potential owing to its advantages, such as straightforward preparation processes, cost-effectiveness, and tunable thickness. However, its practical application is still constrained by the need for further enhancement in key performance indicators, including diffraction efficiency, photosensitivity, and anti-aging properties. In this study, N-vinylpyrrolidone (NVP) is employed as a comonomer. By precisely controlling the doping ratio, we systematically investigate the influence mechanism of different NVP doping concentrations on the holographic performance of NVP-PQ/PMMA materials. Research indicates that the introduction of NVP effectively increases the vinyl concentration in the PQ/PMMA matrix, thereby directly generating photoproducts with PQ during the photoreaction process and further enhancing the photopolymerization process. Consequently, the holographic performance of the novel NVP-PQ/PMMA material is improved in a multi-faceted manner compared to ordinary PQ/PMMA. Specifically, the diffraction efficiency is enhanced by 1.93 times, the photosensitivity is increased by 1.64 times, the material uniformity is improved by 38%, and the light-induced shrinkage rate is reduced by 39%. Additionally, NVP-PQ/PMMA materials exhibit excellent stability and aging resistance in high-temperature accelerated aging experiments. Doping with a monomer of specific structure enhances the optical properties, providing broad adaptability for further research on PQ/PMMA photopolymer materials.
光聚合物PQ/PMMA作为全息存储领域的关键材料,因其制备工艺简单、成本效益高、厚度可调等优点而具有显著的应用潜力。然而,其实际应用仍受到关键性能指标进一步提升的限制,这些指标包括衍射效率、光敏性和抗老化性能。在本研究中,N-乙烯基吡咯烷酮(NVP)被用作共聚单体。通过精确控制掺杂比例,我们系统地研究了不同NVP掺杂浓度对NVP-PQ/PMMA材料全息性能的影响机制。研究表明,NVP的引入有效地提高了PQ/PMMA基体中的乙烯基浓度,从而在光反应过程中直接与PQ生成光产物,并进一步增强了光聚合过程。因此,与普通PQ/PMMA相比,新型NVP-PQ/PMMA材料的全息性能在多方面得到了改善。具体而言,衍射效率提高了1.93倍,光敏性提高了1.64倍,材料均匀性提高了38%,光致收缩率降低了39%。此外,NVP-PQ/PMMA材料在高温加速老化实验中表现出优异的稳定性和抗老化性能。掺杂特定结构的单体增强了光学性能,为PQ/PMMA光聚合物材料的进一步研究提供了广泛的适应性。