He Cong, Wen Zhenchao, Okabayashi Jun, Miura Yoshio, Ma Tianyi, Ohkubo Tadakatsu, Seki Takeshi, Sukegawa Hiroaki, Mitani Seiji
National Institute for Materials Science (NIMS), Tsukuba, Japan.
Hunan University, Changsha, China.
Nat Commun. 2025 Sep 24;16(1):8235. doi: 10.1038/s41467-025-63344-y.
Altermagnetism presents intriguing possibilities for spintronic devices due to its unique combination of strong spin-splitting and zero net magnetization. However, realizing its full potential hinges on fabricating single-variant altermagnetic thin films. In this work, we present definitive evidence for formation of single-variant altermagnetic RuO(101) thin films with fully epitaxial growth on AlO(1 02) r-plane substrates, confirmed through rigorous structural analyses using X-ray diffraction, atomic-resolution transmission electron microscopy and X-ray magnetic linear dichroism. The mutual correspondence of the occupancy of oxygen atoms on the surfaces of RuO(101)[010] and AlO(1 02)[11 0] plays a decisive role in the formation of the single-variant RuO, which is also supported by our first-principles density functional theory calculations. We further observed spin-splitting magnetoresistance in the single-variant RuO(101)/CoFeB bilayers, highlighting the characteristic effect of single variant on spin transport. The demonstration of single-variant RuO(101) films marks a significant advancement in the field of altermagnetism and paves the way for exploring their potential applications.