Ramsay C A
J Invest Dermatol. 1979 Feb;72(2):99-102. doi: 10.1111/1523-1747.ep12530306.
There are several groups of chemicals that may produce contact photodermatitis and the action spectra for photopatch tests with these chemicals have been established. Controversy exists about UVR sensitivity in patients with contact photodermatitis when tests are performed on normal appearing skin without the addition of the chemical. Four patients became "persistent light reactors" after developing contact photodermatitis from fentichlor, 3 after using a hair cream containing the chemical, the 4th after industrial exposure. Normal appearing skin on the back of the trunk was tested to narrow waveband UVR and visible light, fentichlor was not added to the skin during these tests. Abnormal reactions to UVB occurred in all 4 patients and all showed sensitivity to UVA, to 340 nm in 1, to 360 nm in 1 and to 400 nm in 2. At pH 4 fentichlor absorbed between 310 nm and 325 nm, but at pH 9.2 absorption was between 275 nm and 350 nm, there was no absorption above 350 nm. The results of tests with narrow waveband UVR show that true sensitivity to UVB does exist in the normal appearing skin of "persistent light reactors," the sensitivity is not spurious. The normal skin of these patients is also sensitive to UVA. Possible reasons for the URV sensitivity are discussed.
有几类化学物质可能会引起接触性光皮炎，并且已经确定了用这些化学物质进行光斑贴试验的作用光谱。当在未添加化学物质的外观正常的皮肤上进行测试时，接触性光皮炎患者的紫外线辐射（UVR）敏感性存在争议。4名患者在因芬替氯发生接触性光皮炎后成为“持续性光反应者”，其中3名在使用含该化学物质的发乳后出现，第4名在职业暴露后出现。对躯干背部外观正常的皮肤进行窄波段UVR和可见光测试，在这些测试过程中未向皮肤上添加芬替氯。所有4名患者对UVB均出现异常反应，并且均显示对UVA敏感，1例对340nm敏感，1例对360nm敏感，2例对400nm敏感。在pH值为4时，芬替氯在310nm至325nm之间有吸收，但在pH值为9.2时，吸收在275nm至350nm之间，在350nm以上没有吸收。窄波段UVR测试结果表明，“持续性光反应者”外观正常的皮肤中确实存在对UVB的真正敏感性，这种敏感性并非虚假的。这些患者的正常皮肤对UVA也敏感。文中讨论了UVR敏感性的可能原因。
