Muhammed A, Setlow J K
J Bacteriol. 1974 May;118(2):514-22. doi: 10.1128/jb.118.2.514-522.1974.
The extent of association between donor transforming deoxyribonucleic acid (DNA) and recipient DNA in Haemophilus influenzae as a function of ultraviolet (UV) dose to the transforming DNA has been measured by isopycnic analysis of lysates of (3)H-labeled recipient cells exposed to DNA labeled with (32)P and heavy isotopes. Except for doses above 15,000 ergs/mm(2), the results of these measurements are in good agreement with previous estimates made by another technique. Experiments with a mutant temperature sensitive for DNA synthesis and another mutant defective in excision of pyrimidine dimers suggest that the discrepancy between the methods of high doses results from DNA synthesis, in which portions of the associated donor DNA containing pyrimidine dimers are excised and broken down, and the components are reutilized for synthesis. Repair of UV-irradiated, transforming DNA during incubation of recipient cells is observed as an increase in transforming ability when fractions from CsCl gradients of cell lysates are assayed on excision-deficient cells. When transforming DNA containing markers of different UV sensitivities is used, repair of the UV-resistant nov marker by excision proficient cells takes place exclusively in the donor DNA that is associated with recipient DNA, and this repair is observed even in the absence of DNA synthesis. However, no repair is observed in the case of the more UV-sensitive str marker, possibly because excision events may remove a large fraction of the integrated str markers in addition to repairing a small fraction of the integrated DNA containing this marker.
通过对暴露于用³²P和重同位素标记的DNA的³H标记受体细胞裂解物进行等密度分析,测量了流感嗜血杆菌中供体转化脱氧核糖核酸(DNA)与受体DNA之间的关联程度,该关联程度是紫外线(UV)剂量对转化DNA作用的函数。除了高于15,000尔格/毫米²的剂量外,这些测量结果与先前用另一种技术做出的估计非常一致。对DNA合成温度敏感的突变体和嘧啶二聚体切除缺陷的另一种突变体进行的实验表明,高剂量方法之间的差异源于DNA合成,其中含有嘧啶二聚体的相关供体DNA部分被切除并分解,其成分被重新用于合成。当在切除缺陷细胞上测定细胞裂解物的CsCl梯度级分时,受体细胞孵育期间紫外线照射的转化DNA的修复表现为转化能力的增加。当使用含有不同紫外线敏感性标记的转化DNA时,切除能力强的细胞对紫外线抗性的nov标记的修复仅发生在与受体DNA相关的供体DNA中,并且即使在没有DNA合成的情况下也能观察到这种修复。然而,对于紫外线敏感性更高的str标记,未观察到修复,这可能是因为切除事件除了修复含有该标记的一小部分整合DNA外,还可能去除大部分整合的str标记。