Novotny C P, Taylor P F, Lavin K
J Bacteriol. 1972 Dec;112(3):1083-9. doi: 10.1128/jb.112.3.1083-1089.1972.
The effects of chloramphenicol, nalidixic acid, mitomycin C, NaCN, and ultraviolet irradiation at 253.7 nm on F pili production by Escherichia coli cells was studied by electron microscopy. The results show that cells contain pools of pili protein, and that assembly does not require synthesis of protein or deoxyribonucleic acid (DNA). NaCN (2 x 10(-2)m) prevents the reappearance of pili and causes existing pili to disappear quickly from the cell surface. This suggests that energy is used in the assembly of pili and to retain pili on the cell. Cells irradiated with high doses (10(4)ergs/mm(2)) of 253. 7 nm light produce fewer pili, and these are shorter than normal. Dose-response curves for number of pili per cell and length of pili resemble single hit kinetics, showing 37% survival at 10(4) ergs/mm(2) and 2 x 10(4) ergs/mm(2), respectively. This suggests that DNA is at the site where pili are produced, and that it may be involved in the assembly of pili.
通过电子显微镜研究了氯霉素、萘啶酸、丝裂霉素C、氰化钠以及253.7nm紫外线照射对大肠杆菌细胞F菌毛产生的影响。结果表明，细胞含有菌毛蛋白库，且菌毛组装不需要蛋白质或脱氧核糖核酸（DNA）的合成。氰化钠（2×10⁻²m）可阻止菌毛重新出现，并使细胞表面已有的菌毛迅速消失。这表明能量用于菌毛的组装以及将菌毛保留在细胞上。用高剂量（10⁴尔格/毫米²）的253.7nm光照射的细胞产生的菌毛较少，且这些菌毛比正常的短。每个细胞的菌毛数量和菌毛长度的剂量反应曲线类似于单次打击动力学，在10⁴尔格/毫米²和2×10⁴尔格/毫米²时分别显示37%的存活率。这表明DNA位于菌毛产生的部位，并且它可能参与菌毛的组装。
