紫外线或X射线照射后枯草芽孢杆菌染色体起始位点的基因频率分析。
Gene frequency analysis of chromosomal initiation sites in Bacillus subtilis after ultraviolet light or x-ray exposure.
作者信息
Billen D, Hellerman G, Carreira L
出版信息
J Bacteriol. 1972 Jan;109(1):379-84. doi: 10.1128/jb.109.1.379-384.1972.
Abstract
Bacillus subtilis was exposed to ultraviolet light (UV) or X rays, and gene frequency analysis was used to study the location of initiation sites of postirradiation deoxyribonucleic acid (DNA) synthesis. It was found that DNA synthesis resumes primarily from the origin after UV exposure. With X irradiation, the origin is not selectively replicated. Elevated origin-to-terminal marker ratios observed after UV exposure of exponentially growing cells were interpreted as evidence for selective UV resistance of the replicative origin region of the bacterial chromosome.
摘要
将枯草芽孢杆菌暴露于紫外线（UV）或X射线下，通过基因频率分析来研究辐照后脱氧核糖核酸（DNA）合成起始位点的位置。结果发现，紫外线照射后DNA合成主要从起始点恢复。而在X射线照射下，起始点不会被选择性复制。对数生长期细胞经紫外线照射后观察到的起始点与末端标记物比率升高，被解释为细菌染色体复制起始区域具有选择性抗紫外线能力的证据。
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