Clark R A, Gallin J I, Kaplan A P
J Allergy Clin Immunol. 1976 Dec;58(6):623-34. doi: 10.1016/0091-6749(76)90174-3.
Mediator release from the leukocytes of two patients with chronic myelogenous leukemia and basophilia was studied using rabbit antihuman IgE antibody. The release of histamine, slow reacting substance of anaphylaxis (SRS-A), platelet activating factor (PAF), chemotactic activity for neutrophils and eosinophils, and an inhibitor of eosinophil migration was observed. However, the release of SRS-A from the basophils of one patient and the release of chemotactic activity from both patients displayed unusual properties. During acceleration of the disease process, the basophils of one patient released maximal SRS-A activity at progressively lower concentrations of anti-IgE. Both patients released a high molecular weight factor (M.W. greater than 20,000) which enhanced the migration of neutrophils and eosinophils and a low molecular weight chemotactic factor (M.W. less than 500) which selectively attracted eosinophils. A double peak of eosinophil chemotactic activity was routinely observed for the low molecular weight factor; this was shown to represent the eosinophil chemotactic activity of histamine with relative inhibition of migration at the histamine peak. There was little release of the tetrapeptides, ECF-A, in these patients which facilitated demonstration of this eosinophilotactic activity of histamine. These results suggest that the eosinophil chemotactic activity observed in acute allergic reactions is the net effect of the release of multiple chemotactic factors.
使用兔抗人IgE抗体研究了两名慢性粒细胞白血病伴嗜碱性粒细胞增多症患者白细胞中的介质释放情况。观察到组胺、过敏反应慢反应物质(SRS-A)、血小板活化因子(PAF)、对中性粒细胞和嗜酸性粒细胞的趋化活性以及嗜酸性粒细胞迁移抑制剂的释放。然而,一名患者嗜碱性粒细胞中SRS-A的释放以及两名患者趋化活性的释放表现出异常特性。在疾病进程加速期间,一名患者的嗜碱性粒细胞在逐渐降低的抗IgE浓度下释放出最大SRS-A活性。两名患者均释放出一种高分子量因子(分子量大于20,000),该因子增强了中性粒细胞和嗜酸性粒细胞的迁移,以及一种低分子量趋化因子(分子量小于500),该因子选择性地吸引嗜酸性粒细胞。对于低分子量因子,常规观察到嗜酸性粒细胞趋化活性的双峰;这表明在组胺峰处组胺的嗜酸性粒细胞趋化活性受到相对迁移抑制。在这些患者中,四肽ECF-A的释放很少,这有助于证明组胺的这种嗜酸性粒细胞趋化活性。这些结果表明,在急性过敏反应中观察到的嗜酸性粒细胞趋化活性是多种趋化因子释放的净效应。