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在亚硫酸氢钠和铜离子存在的情况下,丝裂霉素C对噬菌体phi X174的灭活作用。

Inactivation of bacteriophage phi X174 by mitomycin C in the presence of sodium hydrosulfite and cupric ions.

作者信息

Ueda K, Morita J, Yamashita K, Komano T

出版信息

Chem Biol Interact. 1980 Feb;29(2):145-58. doi: 10.1016/0009-2797(80)90029-0.

Abstract

Bacteriophage phi X174 was inactivated by mitomycin C reduced with sodium hydrosulfite in the presence of cupric ions (Cu2+). 99% of the phage particles lost their plaque-forming abilities when incubated with 1.5 . 10(-4) M mitomycin C, 5.7 . 10(-4) M sodium hydrosulfite and 1.0 . 10(-4) M CuCl2 for 120 min at 37 degrees C in 0.05 M Tris--HCl buffer (pH 8.1). Sodium borohydride and thiol-reducing agents such as L-cysteine, 2-mercaptoethanol or dithiothreitol could not serve as a substitute for sodium hydrosulfite and other transition metal ions such as Fe2+, Fe3+, Mn2+, Co2+ and Zn2+ were of no effect. Inactivated phage sedimented at 114S just as intact phage, but phage DNA was degraded. Strand-scission was observed when phi X174 single-stranded DNA was directly reacted with mitomycin C reduced with sodium hydrosulfite in the presence of CuCl2. Phage inactivation was inhibited bycatalase, EDTA and several scavengers such as cysteamine, 2-aminoethylisothiuronium bromide HBr (AET), 4,5-dihydroxy-1,3-benzene-disulfonic acid (Tiron), or 1,4-diazabicyclo[2,2,2]octane (DABCO). These results suggest that free oxygen radicals and mitomycin C semiquinone radical generated during autoxidation of reduced mitomycin C in the presence of cupric ions cause the degradation of phy X174 DNA.

摘要

在铜离子(Cu2+)存在的情况下,用连二亚硫酸钠还原的丝裂霉素C可使噬菌体φX174失活。当在0.05 M Tris-HCl缓冲液(pH 8.1)中于37℃将1.5×10(-4) M丝裂霉素C、5.7×10(-4) M连二亚硫酸钠和1.0×10(-4) M CuCl2与噬菌体颗粒一起孵育120分钟时,99%的噬菌体颗粒丧失了其形成噬菌斑的能力。硼氢化钠以及诸如L-半胱氨酸、2-巯基乙醇或二硫苏糖醇等硫醇还原剂不能替代连二亚硫酸钠,而其他过渡金属离子如Fe2+、Fe3+、Mn2+、Co2+和Zn2+则没有作用。失活的噬菌体与完整噬菌体一样在114S处沉降,但噬菌体DNA被降解。当φX174单链DNA在CuCl2存在的情况下直接与用连二亚硫酸钠还原的丝裂霉素C反应时,观察到了链断裂。过氧化氢酶、EDTA以及几种清除剂如半胱胺、2-氨基乙基异硫脲溴化氢(AET)、4,5-二羟基-1,3-苯二磺酸(钛铁试剂)或1,4-二氮杂双环[2,2,2]辛烷(DABCO)可抑制噬菌体失活。这些结果表明,在铜离子存在的情况下,还原型丝裂霉素C自氧化过程中产生的游离氧自由基和丝裂霉素C半醌自由基导致了φX174 DNA的降解。

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