Jarvis B, Vormbrock J, Saccuzzo D P
Percept Mot Skills. 1983 Aug;57(1):139-42. doi: 10.2466/pms.1983.57.1.139.
Letter-stimuli as targets were presented to the right or left visual fields and followed either by a flash of light or by a flash of light plus a patterned mask. The patterned mask always appeared in the opposite visual field of the letter targets. Analysis showed that masking occurred for both types of masks but that subjects produced more errors at each of five intervals between onset of the target and onset of the mask for the flash of light plus a patterned mask in the opposite visual field than for the flash of light alone. A pattern mask, when presented to the opposite visual field of a target stimulus, interferes with target processing at short target-mask intervals. These findings suggest that central backward masking may involve target-mask interactions beyond the visual cortex (Area 17).
将字母刺激作为目标呈现给右视野或左视野，随后要么是一道闪光，要么是一道闪光加上一个图案掩蔽。图案掩蔽总是出现在字母目标的对侧视野中。分析表明，两种类型的掩蔽都会发生，但与单独的闪光相比，当在对侧视野中呈现闪光加上图案掩蔽时，受试者在目标开始与掩蔽开始之间的五个时间间隔中的每个间隔都会产生更多错误。当图案掩蔽呈现给目标刺激的对侧视野时，在短的目标 - 掩蔽间隔下会干扰目标处理。这些发现表明，中枢性逆向掩蔽可能涉及视觉皮层（17区）之外的目标 - 掩蔽相互作用。
