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一种酿酒酵母的新突变体,其在切除DNA中紫外线损伤位点方面存在缺陷。

A new mutant of the yeast Saccharomyces cerevisiae defective in excision of UV-damaged sites in DNA.

作者信息

Bekker M L, Kaboev O K, Koval'tsova S V

出版信息

Mol Gen Genet. 1980 Feb;177(3):541-4. doi: 10.1007/BF00271495.

DOI:10.1007/BF00271495
PMID:6990205
Abstract

An UV-sensitive yeast mutant, uvs12, with almost unchanged sensitivity to gamma-irradiation and methylmethane sulphonate was obtained. uvs12, non allelic to any of the known UV-sensitive mutants from radI to rad21 is defective in early steps of excision repair. This inference is based on the fact that after 4-5 h post-irradiation incubation unexcised pyrimidine dimers are retained in nuclear DNA, which follows from two independent tests: the retention of UV-endonuclease-sensitive sites and enhanced survival after photoreactivation.

摘要

获得了一种对紫外线敏感的酵母突变体uvs12,它对γ射线和甲基磺酸甲酯的敏感性几乎没有变化。uvs12与已知的从rad1到rad21的任何紫外线敏感突变体都不等位,在切除修复的早期步骤中存在缺陷。这一推断基于以下事实:在照射后培养4-5小时后,未切除的嘧啶二聚体保留在核DNA中,这是通过两项独立测试得出的:紫外线内切酶敏感位点的保留和光复活后存活率的提高。

相似文献

1
A new mutant of the yeast Saccharomyces cerevisiae defective in excision of UV-damaged sites in DNA.一种酿酒酵母的新突变体,其在切除DNA中紫外线损伤位点方面存在缺陷。
Mol Gen Genet. 1980 Feb;177(3):541-4. doi: 10.1007/BF00271495.
2
Induction and repair of closely opposed pyrimidine dimers in Saccharomyces cerevisiae.酿酒酵母中紧密相邻嘧啶二聚体的诱导与修复
Mutat Res. 1987 Nov;184(3):197-207. doi: 10.1016/0167-8817(87)90017-4.
3
Three additional genes involved in pyrimidine dimer removal in Saccharomyces cerevisiae: RAD7, RAD14 and MMS19.酿酒酵母中参与嘧啶二聚体去除的另外三个基因:RAD7、RAD14和MMS19。
Mol Gen Genet. 1979 Nov;176(3):351-9. doi: 10.1007/BF00333097.
4
Repair of UV-irradiated plasmid DNA in a Saccharomyces cerevisiae rad3 mutant deficient in excision-repair of pyrimidine dimers.在嘧啶二聚体切除修复缺陷的酿酒酵母rad3突变体中紫外线照射质粒DNA的修复
Mol Gen Genet. 1984;193(1):167-71. doi: 10.1007/BF00327432.
5
Evidence for excision repair in promitochondrial DNA of anaerobic cells of Saccharomyces cerevisiae.酿酒酵母厌氧细胞前线粒体DNA中切除修复的证据。
Mutat Res. 1992 May;273(3):281-8. doi: 10.1016/0921-8777(92)90090-p.
6
The levels of repair of endonuclease III-sensitive sites, 6-4 photoproducts and cyclobutane pyrimidine dimers differ in a point mutant for RAD14, the Saccharomyces cerevisiae homologue of the human gene defective in XPA patients.在RAD14的一个点突变体中,内切核酸酶III敏感位点、6-4光产物和环丁烷嘧啶二聚体的修复水平有所不同。RAD14是人类XPA患者中缺陷基因的酿酒酵母同源物。
Mol Gen Genet. 1996 Mar 7;250(4):515-22. doi: 10.1007/BF02174040.
7
Molecular mechanisms of pyrimidine dimer excision in Saccharomyces cerevisiae: incision of ultraviolet-irradiated deoxyribonucleic acid in vivo.酿酒酵母中嘧啶二聚体切除的分子机制:体内紫外线照射的脱氧核糖核酸的切割
J Bacteriol. 1981 May;146(2):692-704. doi: 10.1128/jb.146.2.692-704.1981.
8
Incision and postincision steps of pyrimidine dimer removal in excision-defective mutants of Saccharomyces cerevisiae.酿酒酵母切除缺陷型突变体中嘧啶二聚体去除的切割及切割后步骤。
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Analysis of gene- and strand-specific repair in the moderately UV-sensitive Saccharomyces cerevisiae rad23 mutant.中度紫外线敏感的酿酒酵母rad23突变体中基因和链特异性修复的分析。
Mutat Res. 1996 Feb 15;362(2):155-65. doi: 10.1016/0921-8777(95)00045-3.
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A new UV-sensitive mutant that suggests a second excision repair pathway in Neurospora crassa.一种新的对紫外线敏感的突变体,这表明粗糙脉孢菌中存在第二条切除修复途径。
Mutat Res. 1998 Sep 11;408(3):171-82. doi: 10.1016/s0921-8777(98)00030-5.

引用本文的文献

1
Molecular mechanisms of pyrimidine dimer excision in Saccharomyces cerevisiae: excision of dimers in cell extracts.酿酒酵母中嘧啶二聚体切除的分子机制:细胞提取物中二聚体的切除
J Bacteriol. 1981 Aug;147(2):705-8. doi: 10.1128/jb.147.2.705-708.1981.
2
Molecular mechanisms of pyrimidine dimer excision in Saccharomyces cerevisiae: incision of ultraviolet-irradiated deoxyribonucleic acid in vivo.酿酒酵母中嘧啶二聚体切除的分子机制:体内紫外线照射的脱氧核糖核酸的切割
J Bacteriol. 1981 May;146(2):692-704. doi: 10.1128/jb.146.2.692-704.1981.
3
Deoxyribonucleic acid repair in the yeast Saccharomyces cerevisiae.

本文引用的文献

1
SEDIMENTATION STUDIES OF THE SIZE AND SHAPE OF DNA.DNA大小与形状的沉降研究
J Mol Biol. 1965 Feb;11:373-90. doi: 10.1016/s0022-2836(65)80064-x.
2
The isolation, genetics and survival characteristics of ultraviolet light-sensitive mutants in yeast.酵母中紫外线敏感突变体的分离、遗传学及存活特性
Mutat Res. 1968 Jul-Aug;6(1):37-55. doi: 10.1016/0027-5107(68)90101-2.
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Repair systems in Saccharomyces.酿酒酵母中的修复系统。
酿酒酵母中的脱氧核糖核酸修复
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Mutat Res. 1974 Aug;26(4):257-64. doi: 10.1016/s0027-5107(74)80023-0.
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Sedimentation properties of yeast chromosomal DNA.酵母染色体DNA的沉降特性
Proc Natl Acad Sci U S A. 1972 May;69(5):1188-91. doi: 10.1073/pnas.69.5.1188.
5
Interactions among genes controlling sensitivity to radiation and alkylation in yeast.酵母中控制对辐射和烷基化敏感性的基因之间的相互作用。
Mol Gen Genet. 1973 Sep 12;125(3):197-216. doi: 10.1007/BF00270743.
6
Repair of pyrimidine dimers in nuclear and mitochondrial DNA of yeast irradiated with low doses of ultraviolet light.低剂量紫外线照射酵母后核DNA和线粒体DNA中嘧啶二聚体的修复
J Mol Biol. 1975 Nov 15;98(4):781-95. doi: 10.1016/s0022-2836(75)80010-6.
7
Repair of pyrimidine dimers in radiation-sensitive mutants rad3, rad4, rad6 and rad9 of Saccharomyces cerevisiae.酿酒酵母辐射敏感突变体rad3、rad4、rad6和rad9中嘧啶二聚体的修复
Mutat Res. 1977 Oct;45(1):13-20. doi: 10.1016/0027-5107(77)90038-0.
8
Defective thymine dimer excision in radiation-sensitive mutants rad10 and rad16 of Saccharomyces cerevisiae.酿酒酵母辐射敏感突变体rad10和rad16中胸腺嘧啶二聚体切除缺陷。
Mol Gen Genet. 1977 Apr 29;152(3):125-8. doi: 10.1007/BF00268808.