Zuk J, Zaborowska D, Swietlińska Z
Mutat Res. 1975 Dec;33(2-3):173-8. doi: 10.1016/0027-5107(75)90192-x.
The UV-sensitive yeast mutants rad3 and rad6 are highly sensitive to diepoxybutane (DEB) as compared with the RAD strain. The two mutants show differential response to liquid holding (LH) after exposure to DEB and UV. The survival of rad3 increases markedly after DEB and decreases after UV. Caffeine significantly affects LH recovery of DEB-treated RAD strain, slightly decreases recovery of rad3 and has almost no effect on survival of rad6. When DEB-treated cultures are plated immediately on caffeine-containing medium, survival of rad3 decreases more significantly than that of the RAD strain, whereas survival of rad6 is only slightly decreased as compared with the untreated cultures. Possible mechanisms of recovery from DEB-induced cell damage are discussed.
与RAD菌株相比,对紫外线敏感的酵母突变体rad3和rad6对1,4 - 丁二醇二缩水甘油醚(DEB)高度敏感。这两个突变体在暴露于DEB和紫外线后对液体保存(LH)表现出不同的反应。rad3在暴露于DEB后的存活率显著增加,而在暴露于紫外线后存活率下降。咖啡因显著影响经DEB处理的RAD菌株的LH恢复,略微降低rad3的恢复率,并且对rad6的存活率几乎没有影响。当将经DEB处理的培养物立即接种在含咖啡因的培养基上时,rad3的存活率比RAD菌株下降得更显著,而rad6的存活率与未处理的培养物相比仅略有下降。文中讨论了从DEB诱导的细胞损伤中恢复的可能机制。