Olefjord I, Hansson S
Department of Engineering Metals, Chalmers University of Technology, Gothenburg, Sweden.
Int J Oral Maxillofac Implants. 1993;8(1):32-40.
Dental implants obtained from four suppliers were analyzed by electron spectroscopy for chemical analysis and scanning electron microscopy. Three of the implants were delivered in a sterilized condition, while the fourth implant was delivered in a plasma-sprayed condition. The covering oxide layer consisted mainly of TiO2. Divalent and trivalent states of titanium were also detected, showing that TiO and Ti2O3 layers occurred. The thickness of the oxide formed on the plasma-sprayed implant was 3.4 nm. The oxide thicknesses of the sterilized implants were 4.6 +/- 0.4 nm. The surfaces of all samples were covered with organic contaminants. A strong fluorine signal was obtained from one sample, indicating that the supplier etches the implants in hydrofluoric acid. Calcium and zinc were found on the surfaces of all samples from one supplier, while calcium and silicon were found on the surfaces of the implants from another supplier. It is suggested that inorganic contaminants should be avoided because these species can possibly provoke the dissolution of titanium.
对从四个供应商处获得的牙科植入物进行了电子能谱化学分析和扫描电子显微镜分析。其中三个植入物以灭菌状态交付，而第四个植入物以等离子喷涂状态交付。覆盖氧化层主要由TiO₂组成。还检测到了钛的二价和三价状态，表明存在TiO和Ti₂O₃层。在等离子喷涂植入物上形成的氧化物厚度为3.4纳米。灭菌植入物的氧化物厚度为4.6±0.4纳米。所有样品的表面都覆盖有有机污染物。从一个样品中获得了强烈的氟信号，表明供应商在氢氟酸中蚀刻植入物。在来自一个供应商的所有样品表面发现了钙和锌，而在来自另一个供应商的植入物表面发现了钙和硅。建议应避免无机污染物，因为这些物质可能会引发钛的溶解。
