[B型和C型DNA对O-甲基羟胺修饰的敏感性]
[Sensitivity of B- and C-DNA forms to modifications by O-methylhydroxylamine].
作者信息
Khromov I S, Kiseleva N P, Tikhonenko T I
出版信息
Biokhimiia. 1977 Jan;42(1):162-6.
Effects of high concentrations of lithium, cesium and ammonium chlorides on the reaction ability of free CMP and cytosine in free DNA of CD phage with respect to O-methylhydroxylamine (OMHA) are studied. CMP reaction in all the cases takes place mainly for 24 hours. Like classical B-form, native DNA, having C-form in high ionic strength solution (as estimated from circular dichroism data), is not modificated. Thus, the access of some cytosine residues in intraphage DNA to OMHA is due not to the decreased DNA hydratation in situ, but to the presence of differently ordered regions in DNA.
研究了高浓度氯化锂、氯化铯和氯化铵对CD噬菌体游离DNA中游离CMP和胞嘧啶相对于O-甲基羟胺（OMHA）的反应能力的影响。在所有情况下，CMP反应主要在24小时内发生。与经典的B型天然DNA一样，在高离子强度溶液中呈C型的天然DNA（根据圆二色性数据估计）未被修饰。因此，噬菌体DNA中某些胞嘧啶残基对OMHA的可及性不是由于原位DNA水合作用降低，而是由于DNA中存在不同有序区域。
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